Lin Sun, Deqing Ma, Ye Liu, Q. Qin, Liang Liang, Hongbin Ma, Fuan Wei, Chao Zhang
{"title":"用XPS蚀刻法测定纯Mg在Cl−环境中的腐蚀产物膜","authors":"Lin Sun, Deqing Ma, Ye Liu, Q. Qin, Liang Liang, Hongbin Ma, Fuan Wei, Chao Zhang","doi":"10.1515/corrrev-2023-0064","DOIUrl":null,"url":null,"abstract":"Abstract X-ray photoelectron spectroscopy (XPS) combined with Ar ion etching was used to analyse the surface film of pure Mg at different depth after immersion in 3.5 % NaCl solution for 10 min. The XPS spectra of specimen surface showed that the corrosion products are mainly made up of Mg(OH)2 and Mg2Cl(OH)3·xH2O. The formation process of Mg2Cl(OH)3 is the reaction of Mg(OH)2 and Cl− and H+ in weak acidic solutions. The XPS results indicated that the intensities of Mg2Cl(OH)3·xH2O decreased with the increase of etching time from 0 s to 4680 s. It is confirmed that the edge of Mg(OH)2 protrudes outward and then splits into Mg2Cl(OH)3 when Cl− attacks the Mg(OH)2 films, so the Mg2Cl(OH)3 attached to Mg(OH)2. Meanwhile, coupling the scanning electron microscope (SEM) and transmission electron microscopy (TEM) with the XPS to analyze the corrosion mechanism. Furthermore, the results displayed that the XPS combined with Ar ion etching is a good characterization method to understand the reaction of corrosion products.","PeriodicalId":10721,"journal":{"name":"Corrosion Reviews","volume":" ","pages":""},"PeriodicalIF":2.7000,"publicationDate":"2023-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Determination of corrosion product film on pure Mg in Cl− environment using XPS etching\",\"authors\":\"Lin Sun, Deqing Ma, Ye Liu, Q. Qin, Liang Liang, Hongbin Ma, Fuan Wei, Chao Zhang\",\"doi\":\"10.1515/corrrev-2023-0064\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract X-ray photoelectron spectroscopy (XPS) combined with Ar ion etching was used to analyse the surface film of pure Mg at different depth after immersion in 3.5 % NaCl solution for 10 min. The XPS spectra of specimen surface showed that the corrosion products are mainly made up of Mg(OH)2 and Mg2Cl(OH)3·xH2O. The formation process of Mg2Cl(OH)3 is the reaction of Mg(OH)2 and Cl− and H+ in weak acidic solutions. The XPS results indicated that the intensities of Mg2Cl(OH)3·xH2O decreased with the increase of etching time from 0 s to 4680 s. It is confirmed that the edge of Mg(OH)2 protrudes outward and then splits into Mg2Cl(OH)3 when Cl− attacks the Mg(OH)2 films, so the Mg2Cl(OH)3 attached to Mg(OH)2. Meanwhile, coupling the scanning electron microscope (SEM) and transmission electron microscopy (TEM) with the XPS to analyze the corrosion mechanism. Furthermore, the results displayed that the XPS combined with Ar ion etching is a good characterization method to understand the reaction of corrosion products.\",\"PeriodicalId\":10721,\"journal\":{\"name\":\"Corrosion Reviews\",\"volume\":\" \",\"pages\":\"\"},\"PeriodicalIF\":2.7000,\"publicationDate\":\"2023-08-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Corrosion Reviews\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1515/corrrev-2023-0064\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ELECTROCHEMISTRY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Corrosion Reviews","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1515/corrrev-2023-0064","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}
Determination of corrosion product film on pure Mg in Cl− environment using XPS etching
Abstract X-ray photoelectron spectroscopy (XPS) combined with Ar ion etching was used to analyse the surface film of pure Mg at different depth after immersion in 3.5 % NaCl solution for 10 min. The XPS spectra of specimen surface showed that the corrosion products are mainly made up of Mg(OH)2 and Mg2Cl(OH)3·xH2O. The formation process of Mg2Cl(OH)3 is the reaction of Mg(OH)2 and Cl− and H+ in weak acidic solutions. The XPS results indicated that the intensities of Mg2Cl(OH)3·xH2O decreased with the increase of etching time from 0 s to 4680 s. It is confirmed that the edge of Mg(OH)2 protrudes outward and then splits into Mg2Cl(OH)3 when Cl− attacks the Mg(OH)2 films, so the Mg2Cl(OH)3 attached to Mg(OH)2. Meanwhile, coupling the scanning electron microscope (SEM) and transmission electron microscopy (TEM) with the XPS to analyze the corrosion mechanism. Furthermore, the results displayed that the XPS combined with Ar ion etching is a good characterization method to understand the reaction of corrosion products.
期刊介绍:
Corrosion Reviews is an international bimonthly journal devoted to critical reviews and, to a lesser extent, outstanding original articles that are key to advancing the understanding and application of corrosion science and engineering in the service of society. Papers may be of a theoretical, experimental or practical nature, provided that they make a significant contribution to knowledge in the field.