紫外光照射对304L SS在0.1M H2SO4和0.5M NaCl中腐蚀行为的影响

Q4 Materials Science Journal of Surface Science and Technology Pub Date : 2020-08-20 DOI:10.18311/JSST/2020/24037
R. Gupta, S. Chouhan, P. Ganesh, R. Kaul
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摘要

本文研究了紫外光照射对304L不锈钢在0.1M H2SO4和0.5M NaCl介质中电化学腐蚀行为的影响。研究结果表明,在NaCl介质中,UV- a和UV- c暴露使样品的开路电位(OCP)向有源方向移动(较低),表明钝化膜稳定性较差。而在硫酸中,UV-A和UV-C使OCP向高贵方向移动,反映了钝化膜的稳定性。在H2SO4介质中,暴露UV-A和UV-C有助于改善无源性,这表明无源电流密度较低。在NaCl介质中,UV-A和UV-C均降低了材料的抗点蚀能力,表现为Epit(点蚀电位)降低,Icorr(腐蚀电流密度)升高。在H2SO4中,每次极化实验后均观察到均匀溶解,如光学显微照片所示。极化实验后的显微结构表明,在NaCl介质中,两种紫外线照射下的点蚀位点较多。EIS (Nyquist图)显示,在NaCl介质中UV- a和UV- c暴露的样品,其极化电阻(Rp)均低于未暴露的样品。较低的Rp表明钝化膜的保护作用较弱。对于H2SO4,在UV- a和UV- c照射下观察到更高的弧半径(Rp)。
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Influence of UV Irradiation on Corrosion Behavior of 304L SS in 0.1M H2SO4 and 0.5M NaCl
This paper describes an experimental study on the effect of Ultra-Violet (UV) exposure on the electrochemical corrosion behavior of 304L stainless steel in 0.1M H2SO4 and 0.5M NaCl medium. The results of study demonstrate that in NaCl medium, exposure of both UV-A and UV-C shifts the Open Circuit Potential (OCP) in active direction (less noble) as compared to the specimen without UV exposure which indicates less stable passive film. While in sulphuric acid both UV-A and UV-C shifts OCP in noble direction which reflects the stability nature of passive film. In H2SO4 medium, exposure of both UV-A and UV-C assist in improving passivity which is indicated by lower passive current density. In NaCl medium, exposure of both UV-A and UV-C, decrease the pitting corrosion resistance as indicated by lower Epit (pitting potential) and higher Icorr (corrosion current density). In H2SO4 uniform dissolution was observed after each polarization experiment as shown in optical micrographs. In NaCl medium pitting sites are more under both type UV exposures as revealed by microstructure after polarization experiment. EIS (Nyquist plots) showed that exposure of both UV-A and UV-C in NaCl medium specimens have lower polarization resistance (Rp) than without UV exposure. Lower Rp confirms lesser protectiveness of passive film. In case of H2SO4, higher arc radius (Rp) is observed under UV exposure for both UV-A and UV-C.
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期刊介绍: The Indian Society for Surface Science and Technology is an organization for the cultivation, interaction and dissemination of knowledge in the field of surface science and technology. It also strives to promote Industry-Academia interaction
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