不同Al金属电极介质膜的制备及性能研究

IF 3.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IET Nanodielectrics Pub Date : 2022-09-01 DOI:10.1049/nde2.12037
Qi Dong, Shao-Long Zhong, Qi-Kun Feng, Ming-Sheng Zheng, Jiang-Bo Ping, Zhi-Min Dang
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引用次数: 2

摘要

采用真空蒸发法在聚丙烯(PP)、聚酯(PET)和聚酰亚胺(PI)薄膜上制备了不同厚度(片电阻2-100 Ω/□)的铝电极。采用原子力显微镜(AFM)对铝电极的均方根(RMS)和峰谷粗糙度进行了表征。实验发现,与PP衬底相比,PET和PI衬底的Al电极连续生长的阈值厚度降低。铝电极的薄片电阻随峰谷粗糙度的增大而减小。铝电极的电流浪涌能力随均方根粗糙度的增大而减小。在PET薄膜上沉积的Al电极具有更高的片阻和更好的载流能力,金属化薄膜的自愈性能也是三种薄膜中优异的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Preparation and properties of different dielectric films with Al metal electrode

Al electrodes with different thickness (sheet resistance 2–100 Ω/□) were deposited onto the films of polypropylene (PP), polyester (PET) and polyimide (PI) by vacuum evaporation. The root-mean-square (RMS) and peak-to-valley roughness of Al electrodes were characterised by atomic force microscopy (AFM). It was found that the PET and PI substrates showed the reduced threshold thickness of the continuous growth of Al electrodes compared with the PP substrate. The sheet resistance of Al electrodes decreases with the increase of peak-to-valley roughness. The current surge capability of the Al electrode decreases with the increase of RMS roughness. The Al electrode deposited on the PET film has higher sheet resistance and better current carrying capability, and the self-healing performance of metallised film is also excellent among three kinds of films.

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来源期刊
IET Nanodielectrics
IET Nanodielectrics Materials Science-Materials Chemistry
CiteScore
5.60
自引率
3.70%
发文量
7
审稿时长
21 weeks
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