Study of multilayered Cobalt Silicide Nanostructured Thin films prepared by Ion Beam Sputtering

This work focuses on the different existing techniques for synthesis of nanomaterials, the selec-tion of potential process for preparation of Co/Si and Co/Si/Co such that material with optimum charac-teristics may be obtained The process of synthesis plays a crucial role in physical properties and associated phenom-ena acquired by them and hence is a deciding factor in various potential applications of the materials. To study the properties of multi-layered Cobalt Silicide Nanostructured Thin films prepared by Ion Beam Sputtering. The cobalt silicide is selected for synthesis using IBS technique owing to vast scope of its application in manufacturing microelectronic devices. The formation of nanostructured layers is confirmed through XRD and XRR patterns. The role of substrate thickness, interface quality and crystalline structure is very important in deciding properties of multilayers nano-structured thin films.