射频磁控溅射硫化镉薄膜裁剪物理性能的研究

IF 2.2 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Letters: X Pub Date : 2023-06-01 DOI:10.1016/j.mlblux.2023.100190
Harshita Trivedi , Zohreh Ghorannevis , Shilpi Chaudhary , Avanish S. Parmar
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引用次数: 0

摘要

通过改变氩气/氮气混合物中的氮气分压,研究了氮气分压对射频磁控溅射硫化镉薄膜结构和带隙可调性的影响。在氮气的存在下,薄膜具有(0 0 2)择优取向的多晶结构,导致无缺陷、连续、致密和纤维状结构,粗糙度增加。平均透过率增加到>当N2浓度增加时,带隙从2.45 eV减小到2.30 eV。这一工作表明,溅射CdS薄膜的带隙可以随氮气浓度的变化而调整,以实现定制应用。
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Investigations on tailoring physical properties of RF magnetron sputtered Cadmium Sulphide thin films

The effect of nitrogen (N2) partial pressure on the structure and bandgap tunability of RF magnetron sputtered Cadmium Sulphide (CdS) thin films is investigated by varying N2 partial pressure in Ar/N2 mixture. In presence of N2, films have a polycrystalline structure with (0 0 2) preferential orientation, which leads to defect-free, continuous, dense, and fibrous structures with increased roughness. The average optical transmittance increased to > 80 at 500–2500 nm for 30 % N2 partial pressure, whereas the band gap decreases from 2.45 eV to 2.30 eV with increasing N2 concentration. This work shows that the bandgap of sputtered CdS thin films can be tuned with the variation of N2 concentration for customized applications.

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来源期刊
CiteScore
3.10
自引率
0.00%
发文量
50
审稿时长
114 days
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