后退火处理对CAE-VD沉积TiN涂层电化学行为的影响

IF 1.1 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Iranian Journal of Materials Science and Engineering Pub Date : 2021-12-10 DOI:10.22068/IJMSE.2384
Yemurai Vengesa, A. Fattah‐alhosseini, H. Elmkhah, O. Imantalab
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引用次数: 0

摘要

采用阴极电弧蒸发物理气相沉积法(CAE-PVD)在AISI 304不锈钢基体上制备TiN涂层,研究沉积后退火处理对镀层电化学行为的影响。在400℃下对涂层进行1 h的退火处理。采用x射线衍射(XRD)、扫描电镜(SEM)、动电位极化(PDP)和电化学阻抗谱(EIS)测试对所研究的样品进行了表征。通过XRD谱图验证了TiN(111)的择优取向。退火处理后涂层的结晶度提高。SEM观察表明,在基体上形成了无裂纹的TiN涂层。电化学测试结果表明,在较低的电流腐蚀密度下,退火涂层具有较好的耐蚀性。该研究表明,通过沉积后退火可以提高TiN涂层的腐蚀性能
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Effects of the Post-deposition Annealing Treatment on the Electrochemical Behavior of TiN Coating Deposited by CAE-PVD Method
The main purpose of this investigation was to assess the effect of post-deposition annealing treatment on the electrochemical behavior of TiN coating developed on AISI 304 stainless steel substrate using cathodic arc evaporation physical vapor deposition (CAE-PVD). Post-annealing treatment at 400oC was performed on the coated substrate for 1 h. The studied samples were characterized using X-ray diffraction (XRD), scanning electron microscope (SEM), potentiodynamic polarization (PDP), and electrochemical impedance spectroscopy (EIS) tests. The preferred orientation of TiN (111) was verified by XRD patterns. The crystallinity of the coating was increased after annealing treatment. SEM observations indicated that TiN coatings free of cracks were developed on the substrate. The electrochemical measurements elucidated that the annealed coating had better corrosion resistance compared to that of the as-deposited coating with a lower current corrosion density. This investigation implies that improved corrosion performance of the TiN coating can achieved by performing post-deposition annealing
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来源期刊
Iranian Journal of Materials Science and Engineering
Iranian Journal of Materials Science and Engineering MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
1.30
自引率
10.00%
发文量
0
审稿时长
18 weeks
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