{"title":"锡和氧化锡的x射线光电子能谱分析","authors":"A. Chourasia, Allen E. Hillegas","doi":"10.1116/6.0000528","DOIUrl":null,"url":null,"abstract":"Thin film of tin (about 15 nm) was deposited on a silicon ⟨ 100 ⟩ substrate by the e-beam evaporation technique. The sample was oxidized in an oxygen atmosphere. Both the elemental tin and the oxidized sample were characterized in situ by the technique of x-ray photoelectron spectroscopy. Magnesium Kα radiation (energy = 1253.6 eV) was used as the source of x-ray excitation. The data in the tin 3d, 3p, 4p, 4d, Auger MNN regions, and the oxygen 1s region were recorded with a pass energy of 35.75 eV. The oxidized tin was found to form the SnO2 phase. The data will serve as a comparison for the study in this field.","PeriodicalId":22006,"journal":{"name":"Surface Science Spectra","volume":"28 1","pages":"014003"},"PeriodicalIF":1.6000,"publicationDate":"2021-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Analysis of tin and tin oxide by x-ray photoelectron spectroscopy\",\"authors\":\"A. Chourasia, Allen E. Hillegas\",\"doi\":\"10.1116/6.0000528\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Thin film of tin (about 15 nm) was deposited on a silicon ⟨ 100 ⟩ substrate by the e-beam evaporation technique. The sample was oxidized in an oxygen atmosphere. Both the elemental tin and the oxidized sample were characterized in situ by the technique of x-ray photoelectron spectroscopy. Magnesium Kα radiation (energy = 1253.6 eV) was used as the source of x-ray excitation. The data in the tin 3d, 3p, 4p, 4d, Auger MNN regions, and the oxygen 1s region were recorded with a pass energy of 35.75 eV. The oxidized tin was found to form the SnO2 phase. The data will serve as a comparison for the study in this field.\",\"PeriodicalId\":22006,\"journal\":{\"name\":\"Surface Science Spectra\",\"volume\":\"28 1\",\"pages\":\"014003\"},\"PeriodicalIF\":1.6000,\"publicationDate\":\"2021-04-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface Science Spectra\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1116/6.0000528\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Science Spectra","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0000528","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
Analysis of tin and tin oxide by x-ray photoelectron spectroscopy
Thin film of tin (about 15 nm) was deposited on a silicon ⟨ 100 ⟩ substrate by the e-beam evaporation technique. The sample was oxidized in an oxygen atmosphere. Both the elemental tin and the oxidized sample were characterized in situ by the technique of x-ray photoelectron spectroscopy. Magnesium Kα radiation (energy = 1253.6 eV) was used as the source of x-ray excitation. The data in the tin 3d, 3p, 4p, 4d, Auger MNN regions, and the oxygen 1s region were recorded with a pass energy of 35.75 eV. The oxidized tin was found to form the SnO2 phase. The data will serve as a comparison for the study in this field.
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