玻璃基片上生长的VO2薄膜的MOD表征

IF 0.5 4区 工程技术 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC Electronics and Communications in Japan Pub Date : 2023-08-16 DOI:10.1002/ecj.12403
Hideo Wada, Taito Fukawa, Kazuaki Toyota, Masatoshi Koyama, Nobuya Hiroshiba, Kazuto Koike
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引用次数: 0

摘要

本文介绍了用金属有机分解法在玻璃衬底上沉积掺杂Nb的二氧化钒(VO2)薄膜及其热致变色性能。研究了在玻璃衬底上有和没有Hf0.5Zr0.5O2(HZO)缓冲层的VO2薄膜的热致变色性能的差异。在具有HZO缓冲层的玻璃衬底上,VO2薄膜的相变温度成功地从83°C降低到43°C。在没有HZO缓冲层的情况下,VO2薄膜的热致变色性能与HZO缓冲膜相比有所下降。HZO缓冲层有效地抑制了由于Nb掺杂而导致的薄膜VO2晶粒尺寸的小型化。此外,从XPS O1s光谱和XPS深度分布分析判断,它将阻挡Al、Na和Ca杂质离子从玻璃基板的扩散以及VO2薄膜的部分氧化。我们得出的结论是,插入HZO缓冲层是通过MOD控制智能窗口应用中VO2转变温度的一种有用技术。
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Characterization of the VO2 thin films grown on glass substrates by MOD

This paper describes the deposition of Nb doped vanadium dioxide (VO2) films on a glass substrate by metal organic decomposition (MOD) and their thermochromic properties. The difference in thermochromic properties of VO2 thin films on a glass substrate was investigated with and without a buffer layer of Hf0.5Zr0.5O2 (HZO). The phase transition temperature of VO2 thin film successfully reduced from 83°C to 43°C on a glass substrate with a buffer layer of HZO. Without a buffer layer of HZO, the thermochromic properties of VO2 thin films deteriorated comparing with a buffer layer of HZO. HZO buffer layer effectively suppresses the miniaturization of VO2 crystallite size of thin film due to Nb doping. Moreover, it would block out the diffusion of Al, Na, and Ca impurity ions from a glass substrate and the partial oxidation of VO2 thin films judging from XPS O1s spectra and XPS depth profile analysis. We conclude that the insertion of the HZO buffer layer is a useful technique for controlling the transition temperature of VO2 for the smart window applications by MOD.

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来源期刊
Electronics and Communications in Japan
Electronics and Communications in Japan 工程技术-工程:电子与电气
CiteScore
0.60
自引率
0.00%
发文量
45
审稿时长
6-12 weeks
期刊介绍: Electronics and Communications in Japan (ECJ) publishes papers translated from the Transactions of the Institute of Electrical Engineers of Japan 12 times per year as an official journal of the Institute of Electrical Engineers of Japan (IEEJ). ECJ aims to provide world-class researches in highly diverse and sophisticated areas of Electrical and Electronic Engineering as well as in related disciplines with emphasis on electronic circuits, controls and communications. ECJ focuses on the following fields: - Electronic theory and circuits, - Control theory, - Communications, - Cryptography, - Biomedical fields, - Surveillance, - Robotics, - Sensors and actuators, - Micromachines, - Image analysis and signal analysis, - New materials. For works related to the science, technology, and applications of electric power, please refer to the sister journal Electrical Engineering in Japan (EEJ).
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