基于logistic回归模型构建跨境电商人才培养平台

Q1 Business, Management and Accounting Journal of High Technology Management Research Pub Date : 2023-08-29 DOI:10.1016/j.hitech.2023.100473
Minjiang Fang , Dinh Tran Ngoc Huy
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引用次数: 0

摘要

学生的成功对建立跨境电子商务(CBEC)人才发展平台至关重要。对影响成绩的重要方面进行了分析,并对成绩进行了预测,目的是提高学生的学业成绩。为了更好地预测学生的成绩,使用了逻辑回归模型进行因素分析,并实现了惩罚函数。使用K-fold交叉验证核对参数,然后使用坐标下降技术进行估计。模型性能验证结果表明,最小最大凹入惩罚(MCP)和平滑唇绝对偏差(SCAD)惩罚的逻辑回归模型的曲线下面积(AUC)分别为0.772和0.771。MCP和SCAD惩罚的逻辑回归模型的总体准确度分别为0.738和0.739。研究人员发现,对于MCP,学生成绩的预测值和预期值之间的相关系数为0.99949,对于SCAD,为0.99958。MCP和SCAD惩罚的逻辑回归模型由于其优越的预测精度,可以用作CBEC人才培训平台开发的分析工具。
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Building a cross-border e-commerce talent training platform based on logistic regression model

Student success is crucial to the process of building a Cross-border e-commerce (CBEC) talent development platform. Analysis of the important aspects impacting performance and performance prediction are carried out with the goal of enhancing students' academic outcomes. To better forecast student outcomes, a logistic regression model is used for factor analysis, and a penalty function is implemented. Parameters are reconciled using K-fold cross-validation, and then estimated using the coordinate descent technique. Model performance validation findings indicated that the Area Under the curve (AUC) for the minimax concave penalty (MCP) and smoothlyclippedabsolutedeviation(SCAD) penalized logistic regression models were 0.772 and 0.771, respectively. Both the MCP and SCAD penalized logistic regression models have overall accuracies of 0.738 and 0.739, respectively. Researchers found that for MCP, the correlation coefficient was 0.99949, and for SCAD, it was 0.99958, between the projected value and the anticipated value of students' performance. Due to their superior prediction accuracy, the MCP and SCAD penalized logistic regression models may be used as analytical tools in the development of the CBEC talent training platform.

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来源期刊
Journal of High Technology Management Research
Journal of High Technology Management Research Business, Management and Accounting-Strategy and Management
CiteScore
5.80
自引率
0.00%
发文量
9
审稿时长
62 days
期刊介绍: The Journal of High Technology Management Research promotes interdisciplinary research regarding the special problems and opportunities related to the management of emerging technologies. It advances the theoretical base of knowledge available to both academicians and practitioners in studying the management of technological products, services, and companies. The Journal is intended as an outlet for individuals conducting research on high technology management at both a micro and macro level of analysis.
期刊最新文献
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