{"title":"基于PZT的MEMS微加工","authors":"Todd Myers, S. Bose, A. Bandyopadhyay, J. Fraser","doi":"10.1002/9781118370872.CH16","DOIUrl":null,"url":null,"abstract":"PZT thin films, prepared on platinized silicon wafers using a sol-gel technique, were micromachined to create structures for MEMS devices. Standard photolithography techniques were used to create structures in silicon and a silicon substrate using a PZT thin film.","PeriodicalId":7486,"journal":{"name":"American Ceramic Society Bulletin","volume":null,"pages":null},"PeriodicalIF":0.5000,"publicationDate":"2012-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Micro‐Machining of PZT‐Based MEMS\",\"authors\":\"Todd Myers, S. Bose, A. Bandyopadhyay, J. Fraser\",\"doi\":\"10.1002/9781118370872.CH16\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"PZT thin films, prepared on platinized silicon wafers using a sol-gel technique, were micromachined to create structures for MEMS devices. Standard photolithography techniques were used to create structures in silicon and a silicon substrate using a PZT thin film.\",\"PeriodicalId\":7486,\"journal\":{\"name\":\"American Ceramic Society Bulletin\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.5000,\"publicationDate\":\"2012-04-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"American Ceramic Society Bulletin\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1002/9781118370872.CH16\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"MATERIALS SCIENCE, CERAMICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"American Ceramic Society Bulletin","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/9781118370872.CH16","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, CERAMICS","Score":null,"Total":0}
PZT thin films, prepared on platinized silicon wafers using a sol-gel technique, were micromachined to create structures for MEMS devices. Standard photolithography techniques were used to create structures in silicon and a silicon substrate using a PZT thin film.
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