脉冲电流制备钴膜的结构和性能

IF 1.2 4区材料科学 Q4 ELECTROCHEMISTRY Transactions of The Institute of Metal Finishing Pub Date : 1998-01-01 DOI:10.1080/00202967.1998.11871205

E. F. Shtapenko, V. A. Zabludovsky

{"title":"脉冲电流制备钴膜的结构和性能","authors":"E. F. Shtapenko, V. A. Zabludovsky","doi":"10.1080/00202967.1998.11871205","DOIUrl":null,"url":null,"abstract":"The results of studying structure, texture, phase composition and properties of cobalt films obtained by pulsed current are presented. A mechanism of formation of the film structure by pulsed current is proposed. The influence of isothermal annealing on the structure of cobalt films has been revealed.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"39 1","pages":"105-107"},"PeriodicalIF":1.2000,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871205","citationCount":"1","resultStr":"{\"title\":\"Structure and properties of cobalt films obtained by pulsed current\",\"authors\":\"E. F. Shtapenko, V. A. Zabludovsky\",\"doi\":\"10.1080/00202967.1998.11871205\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The results of studying structure, texture, phase composition and properties of cobalt films obtained by pulsed current are presented. A mechanism of formation of the film structure by pulsed current is proposed. The influence of isothermal annealing on the structure of cobalt films has been revealed.\",\"PeriodicalId\":23268,\"journal\":{\"name\":\"Transactions of The Institute of Metal Finishing\",\"volume\":\"39 1\",\"pages\":\"105-107\"},\"PeriodicalIF\":1.2000,\"publicationDate\":\"1998-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1080/00202967.1998.11871205\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Transactions of The Institute of Metal Finishing\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1080/00202967.1998.11871205\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"ELECTROCHEMISTRY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Transactions of The Institute of Metal Finishing","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1080/00202967.1998.11871205","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}

引用次数: 1

摘要

介绍了脉冲电流制备的钴膜的结构、织构、相组成和性能的研究结果。提出了脉冲电流形成薄膜结构的机理。揭示了等温退火对钴膜结构的影响。

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Structure and properties of cobalt films obtained by pulsed current

The results of studying structure, texture, phase composition and properties of cobalt films obtained by pulsed current are presented. A mechanism of formation of the film structure by pulsed current is proposed. The influence of isothermal annealing on the structure of cobalt films has been revealed.

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来源期刊

Transactions of The Institute of Metal Finishing 工程技术-材料科学：膜

CiteScore

3.40

自引率

10.50%

发文量

审稿时长

3 months

期刊介绍： Transactions of the Institute of Metal Finishing provides international peer-reviewed coverage of all aspects of surface finishing and surface engineering, from fundamental research to in-service applications. The coverage is principally concerned with the application of surface engineering and coating technologies to enhance the properties of engineering components and assemblies. These techniques include electroplating and electroless plating and their pre- and post-treatments, thus embracing all cleaning pickling and chemical conversion processes, and also complementary processes such as anodising. Increasingly, other processes are becoming important particularly regarding surface profile, texture, opacity, contact integrity, etc.