电沉积Ni-B合金膜中硼共沉积机理及共沉积硼量的计算

IF 1.2 4区 材料科学 Q4 ELECTROCHEMISTRY Transactions of The Institute of Metal Finishing Pub Date : 1999-01-01 DOI:10.1080/00202967.1999.11871243
M. Onoda, K. Shimizu, Yukio Tateishi, Tohru Watanabe
{"title":"电沉积Ni-B合金膜中硼共沉积机理及共沉积硼量的计算","authors":"M. Onoda, K. Shimizu, Yukio Tateishi, Tohru Watanabe","doi":"10.1080/00202967.1999.11871243","DOIUrl":null,"url":null,"abstract":"SUMMARYWe electrodeposited Ni-B ahoy films using a rotary electrode under various plating conditions and investigated the mechanism of the codeposition of B into the plated films by analyzing the relationship between the electrodeposition conditions and the composition of the plated films, as well as by analyzing electrochemical measurements. We reached the following conclusions: 1) In Ni-B alloy plating by electrodeposition, use of a rotary electrode expands the useful current density regions compared to a static bath.2) Unionized TMAB is present in the plating solution, and the deposition rate of B is related to the thickness of the diffusion layer at the cathode surface, regardless of the electrode potential. Accordingly, the amount of codedeposited B can he calculated from v0.7 and l/I, i.e., peripheral speed and current density.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"77 1","pages":"44-48"},"PeriodicalIF":1.2000,"publicationDate":"1999-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1999.11871243","citationCount":"8","resultStr":"{\"title\":\"Mechanism of Boron Codeposition in Electrodeposited Ni-B Alloy Films and Calculation of the Amount of Codeposited Boron\",\"authors\":\"M. Onoda, K. Shimizu, Yukio Tateishi, Tohru Watanabe\",\"doi\":\"10.1080/00202967.1999.11871243\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"SUMMARYWe electrodeposited Ni-B ahoy films using a rotary electrode under various plating conditions and investigated the mechanism of the codeposition of B into the plated films by analyzing the relationship between the electrodeposition conditions and the composition of the plated films, as well as by analyzing electrochemical measurements. We reached the following conclusions: 1) In Ni-B alloy plating by electrodeposition, use of a rotary electrode expands the useful current density regions compared to a static bath.2) Unionized TMAB is present in the plating solution, and the deposition rate of B is related to the thickness of the diffusion layer at the cathode surface, regardless of the electrode potential. Accordingly, the amount of codedeposited B can he calculated from v0.7 and l/I, i.e., peripheral speed and current density.\",\"PeriodicalId\":23268,\"journal\":{\"name\":\"Transactions of The Institute of Metal Finishing\",\"volume\":\"77 1\",\"pages\":\"44-48\"},\"PeriodicalIF\":1.2000,\"publicationDate\":\"1999-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1080/00202967.1999.11871243\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Transactions of The Institute of Metal Finishing\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1080/00202967.1999.11871243\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"ELECTROCHEMISTRY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Transactions of The Institute of Metal Finishing","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1080/00202967.1999.11871243","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}
引用次数: 8

摘要

摘要:利用旋转电极在不同的电镀条件下电沉积了Ni-B - ahoy薄膜,通过分析电沉积条件与镀层成分的关系以及电化学测量结果的分析,探讨了B在镀层中共沉积的机理。得到以下结论:1)电沉积镀Ni-B合金时,旋转电极的使用比静态电极扩大了有效电流密度区域。2)镀液中存在游离化的TMAB, B的沉积速率与阴极表面扩散层的厚度有关,而与电极电位无关。因此,可以从v0.7和l/I(即外设速度和电流密度)计算出编码沉积的B量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Mechanism of Boron Codeposition in Electrodeposited Ni-B Alloy Films and Calculation of the Amount of Codeposited Boron
SUMMARYWe electrodeposited Ni-B ahoy films using a rotary electrode under various plating conditions and investigated the mechanism of the codeposition of B into the plated films by analyzing the relationship between the electrodeposition conditions and the composition of the plated films, as well as by analyzing electrochemical measurements. We reached the following conclusions: 1) In Ni-B alloy plating by electrodeposition, use of a rotary electrode expands the useful current density regions compared to a static bath.2) Unionized TMAB is present in the plating solution, and the deposition rate of B is related to the thickness of the diffusion layer at the cathode surface, regardless of the electrode potential. Accordingly, the amount of codedeposited B can he calculated from v0.7 and l/I, i.e., peripheral speed and current density.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Transactions of The Institute of Metal Finishing
Transactions of The Institute of Metal Finishing 工程技术-材料科学:膜
CiteScore
3.40
自引率
10.50%
发文量
62
审稿时长
3 months
期刊介绍: Transactions of the Institute of Metal Finishing provides international peer-reviewed coverage of all aspects of surface finishing and surface engineering, from fundamental research to in-service applications. The coverage is principally concerned with the application of surface engineering and coating technologies to enhance the properties of engineering components and assemblies. These techniques include electroplating and electroless plating and their pre- and post-treatments, thus embracing all cleaning pickling and chemical conversion processes, and also complementary processes such as anodising. Increasingly, other processes are becoming important particularly regarding surface profile, texture, opacity, contact integrity, etc.
期刊最新文献
Comparing brightness of nanocrystalline nickel coating with traditional bright nickel coating and investigation of stereochemistry of brightener molecules Transactions of the institute of materials finishing 2023, volume 101Author Index Annual Contents 2023 Industry News Tribological study on cast iron based, graphite and CNT enriched hybrid HVOF coating from room temperature to 300°C
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1