掺杂锗提高CdO薄膜载流子迁移率

Q3 Engineering Advances in Optoelectronics Pub Date : 2013-04-03 DOI:10.1155/2013/804646
A. Dakhel
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引用次数: 17

摘要

本文研究了锗掺杂氧化镉(CdO: Ge)薄膜的结构、光学和电学性能。重点是改进载流子迁移率,以同时实现近红外光的高透明度和低电阻率。用x射线衍射、扫描电镜、光谱光度法和霍尔测量法研究了其性质。所有CdO: Ge薄膜沿[111]方向均为高织构取向的多晶。观察到载流子浓度()和迁移率()可以用ge掺杂水平来控制。当Ge掺杂量为0.25 wt%时,迁移率可提高到最高的cm2/V·s,同时在近红外光谱区保持低至Ω·cm的电阻率和良好的透明度%。本文的研究结果证明,选择锗作为掺杂剂可以在透明导电氧化物(TCO)领域中实现高载流子迁移率和低电阻率的应用。总的来说,所发现的特性使CdO: Ge薄膜在光电器件(如薄膜太阳能电池)中的应用特别有趣。
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Germanium Doping to Improve Carrier Mobility in CdO Films
This investigation addresses the structural, optical, and electrical properties of germanium incorporated cadmium oxide (CdO : Ge) thin films. The focus was on the improvement in carrier mobility to achieve high transparency for near-infrared light and low resistivity at the same time. The properties were studied using X-ray diffraction, SEM, spectral photometry, and Hall measurements. All CdO : Ge films were polycrystalline with high texture orientation along [111] direction. It was observed that it is possible to control the carrier concentration () and mobility () with Ge-incorporation level. The mobility could be improved to a highest value of  cm2/V·s with Ge doping of 0.25 wt% while maintaining the electrical resistivity as low as  Ω·cm and good transparency % in the NIR spectral region. The results of the present work proved to select Ge as dopant to achieve high carrier mobility with low resistivity for application in transparent conducting oxide (TCO) field. Generally, the properties found make CdO : Ge films particularly interesting for the application in optoelectronic devices like thin-film solar cells.
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来源期刊
Advances in Optoelectronics
Advances in Optoelectronics ENGINEERING, ELECTRICAL & ELECTRONIC-
CiteScore
1.30
自引率
0.00%
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0
期刊介绍: Advances in OptoElectronics is a peer-reviewed, open access journal that publishes original research articles as well as review articles in all areas of optoelectronics.
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