用椭偏光谱法研究了氢化ZnO-Ga薄膜的光学性质

IF 0.6 4区 物理与天体物理 Q4 OPTICS 红外与毫米波学报 Pub Date : 2016-02-01 DOI:10.11972/j.issn.1001-9014.2016.01.002
Y. Jiao, Gao Mei-zhen
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引用次数: 0

摘要

研究了Ga掺杂对溶胶-凝胶法制备氢化ZnO-Ga (GZO)薄膜结构、电学和光学性能的影响。通过x射线衍射观察,发现掺杂不同镓浓度的薄膜是纯纤锌矿结构的ZnO。氢退火膜的电学性能得到改善,电阻率最低为3。410 × 10(-3) ω。得到Cm。采用变角度椭圆偏振法(VASE)测定了ZnO-Ga薄膜在270 ~ 1600 nm范围内的折射率和消光系数。采用双振子模型进行仿真,该模型包括Psemi-MO方程和rho-tau Drude方程。
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Optical properties of hydrogenated ZnO-Ga thin films studied by spectroscopic ellipsometry
The effects of Ga doping on structural, electrical, and optical properties of hydrogenated ZnO-Ga (GZO) thin films deposited by sol-gel technique have been investigated. From the X-ray diffraction observations, the films doped with different gallium concentrations were found to be pure wurtzite-structured ZnO. The electrical properties of the hydrogen -annealed films were improved and a lowest resistivity of 3. 410 x 10(-3) Omega.cm was obtained. The refractive index and extinction coefficient of ZnO-Ga thin films were determined in the range of 270 1600 nm by varying angle spectroscopic ellipsometry (VASE). The simulation was carried out using a double oscillator model, which includes the Psemi-MO equation and the rho-tau Drude equation.
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来源期刊
CiteScore
1.20
自引率
14.30%
发文量
4258
审稿时长
2.9 months
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