钼和硒的电化学共沉积

Metallurgy and Foundry Engineering Pub Date : 2015-07-10 DOI:10.7494/MAFE.2015.41.1.7

R. Kowalik, D. Kutyła, K. Mech, M. Wróbel, T. Tokarski, P. Żabiński

{"title":"钼和硒的电化学共沉积","authors":"R. Kowalik, D. Kutyła, K. Mech, M. Wróbel, T. Tokarski, P. Żabiński","doi":"10.7494/MAFE.2015.41.1.7","DOIUrl":null,"url":null,"abstract":"The electrodeposition of the Mo-Se thin films from sulfate solution containing Na 2 MoO 4 and H 2 SeO 3 was studied. The process of deposition were conducted under potentiostatic condition on copper electrode. The effect of different potential, pH and time of deposition were examined. The deposits were characterized by X-ray diffraction, X-ray fluorescence and scanning electron microscopy.","PeriodicalId":18751,"journal":{"name":"Metallurgy and Foundry Engineering","volume":"1 1","pages":"7"},"PeriodicalIF":0.0000,"publicationDate":"2015-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Electrochemical codeposition of molybdenum and selenium\",\"authors\":\"R. Kowalik, D. Kutyła, K. Mech, M. Wróbel, T. Tokarski, P. Żabiński\",\"doi\":\"10.7494/MAFE.2015.41.1.7\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The electrodeposition of the Mo-Se thin films from sulfate solution containing Na 2 MoO 4 and H 2 SeO 3 was studied. The process of deposition were conducted under potentiostatic condition on copper electrode. The effect of different potential, pH and time of deposition were examined. The deposits were characterized by X-ray diffraction, X-ray fluorescence and scanning electron microscopy.\",\"PeriodicalId\":18751,\"journal\":{\"name\":\"Metallurgy and Foundry Engineering\",\"volume\":\"1 1\",\"pages\":\"7\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Metallurgy and Foundry Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.7494/MAFE.2015.41.1.7\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Metallurgy and Foundry Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.7494/MAFE.2015.41.1.7","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

研究了在硫酸钠和硫酸氢溶液中电沉积钼硒薄膜的方法。在恒电位条件下在铜电极上进行沉积过程。考察了不同电位、pH和沉积时间对沉积效果的影响。用x射线衍射、x射线荧光和扫描电镜对沉积物进行了表征。

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Electrochemical codeposition of molybdenum and selenium

The electrodeposition of the Mo-Se thin films from sulfate solution containing Na 2 MoO 4 and H 2 SeO 3 was studied. The process of deposition were conducted under potentiostatic condition on copper electrode. The effect of different potential, pH and time of deposition were examined. The deposits were characterized by X-ray diffraction, X-ray fluorescence and scanning electron microscopy.

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Metallurgy and Foundry Engineering

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