FLG/InP肖特基触点的电子特性

Fulya Esra CİMİLLİ ÇATIR, Murat Gülnahar
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摘要

石墨烯(Gr)在新型电子、光子和复合材料的开发中具有重要意义。Gr的物理性质可以根据层数而变化,这种独特的性质使其成为不同电子应用的潜在材料。在本研究中,将少层石墨烯(FLG)薄膜自旋涂覆在InP半导体表面,并产生FLG/n-InP肖特基接触。利用拉曼光谱法测定了FLG纳米膜的性能和质量。利用电流-电压(I-V)曲线计算肖特基触点的理想因数、势垒高度和串联电阻等参数。在高斯分布下,Gr/InP触点的平均理想系数为=1,47,势垒平均高度为=0.68 eV。理想因子标准差为σ=0.32,势垒高度标准差为σ=0.06 eV。此外,根据张氏函数计算了串联电阻值,发现与文献一致。最后,通过对数I-V特性揭示了Gr/n-InP结构的电流传导机制。
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Electronic Properties of FLG/InP Schottky Contacts
Graphene (Gr) is of great interest in the development of new electronic, photonic, and composite materials. The physical properties of Gr can vary depending on the number of layers, and this unique property makes it a potential material for different electronic applications. In this study, few-layer graphene (FLG) film was spin-coated onto the InP semiconductor surface and the FLG/n-InP Schottky contact was produced. The properties and quality of the FLG nano-film were determined by using Raman spectroscopy. Parameters such as ideality factor, barrier height, and series resistance of Schottky contacts were calculated using current-voltage (I-V) curves. With the Gaussian distribution, the mean ideality factor of the Gr/InP contacts was found to be =1,47, and the mean barrier height values were found to be =0.68 eV. The standard deviation values were calculated as σ=0.32 for the ideality factor and σ=0.06 eV for the barrier height. In addition, the series resistance values were calculated from the Cheung functions and were found to be in agreement with the literature. Finally, the current conduction mechanisms of the Gr/n-InP structure were revealed by examining the logarithmic I-V characteristics.
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