R. Le Parc, B. Champagnon, L. David, A. Faivre, C. Levelut, P. Guenot, J. Hazemann, C. Rochas, J. Simon
{"title":"小角x射线散射法研究二氧化硅密度波动的温度依赖性","authors":"R. Le Parc, B. Champagnon, L. David, A. Faivre, C. Levelut, P. Guenot, J. Hazemann, C. Rochas, J. Simon","doi":"10.1080/13642810208223131","DOIUrl":null,"url":null,"abstract":"Abstract Low-OH-content silica samples having fictive temperatures in the interval 1000–1500°C, have been studied by small-angle X-ray scattering using synchrotron radiations both at room temperature and from 20 to 1500deg;C. The limit for zero-angle X-ray scattering intensity is analysed in term of density fluctuations. We demonstrate that density fluctuations are strongly related to structural relaxation; both depend on thermal history (i.e. the fictive temperature) of the sample, in the temperature range below Tg.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2002-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"Temperature dependence of the density fluctuations of silica by small-angle X-ray scattering\",\"authors\":\"R. Le Parc, B. Champagnon, L. David, A. Faivre, C. Levelut, P. Guenot, J. Hazemann, C. Rochas, J. Simon\",\"doi\":\"10.1080/13642810208223131\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract Low-OH-content silica samples having fictive temperatures in the interval 1000–1500°C, have been studied by small-angle X-ray scattering using synchrotron radiations both at room temperature and from 20 to 1500deg;C. The limit for zero-angle X-ray scattering intensity is analysed in term of density fluctuations. We demonstrate that density fluctuations are strongly related to structural relaxation; both depend on thermal history (i.e. the fictive temperature) of the sample, in the temperature range below Tg.\",\"PeriodicalId\":20016,\"journal\":{\"name\":\"Philosophical Magazine Part B\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Philosophical Magazine Part B\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1080/13642810208223131\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Philosophical Magazine Part B","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1080/13642810208223131","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Temperature dependence of the density fluctuations of silica by small-angle X-ray scattering
Abstract Low-OH-content silica samples having fictive temperatures in the interval 1000–1500°C, have been studied by small-angle X-ray scattering using synchrotron radiations both at room temperature and from 20 to 1500deg;C. The limit for zero-angle X-ray scattering intensity is analysed in term of density fluctuations. We demonstrate that density fluctuations are strongly related to structural relaxation; both depend on thermal history (i.e. the fictive temperature) of the sample, in the temperature range below Tg.
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