{"title":"硅衬底隔离电极静电驱动微镜的设计与优化","authors":"C. Florin, C. Tibeica, M. Purica","doi":"10.1109/SMICND.2008.4703348","DOIUrl":null,"url":null,"abstract":"In this paper one type of an electrostatic actuated micromirror structure was simulated using Coventorware software, taking into account the material properties and structure geometry in order to optimize the structure. A characteristic response (displacement versus voltage) for simulated structure is the hysteresis loop of displacement. By reducing the length off the bottom electrode and also the length of the upper isolating layer we can obtain larger displacement of 12 mum. The optimized mirror reflective surface has a size of 120 mum times 120 mum.","PeriodicalId":6406,"journal":{"name":"2008 IEEE International Conference on Semiconductor Electronics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2008-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Design and optimization of an electrostatic actuated micromirror with isolated bottom electrode on silicon substrate\",\"authors\":\"C. Florin, C. Tibeica, M. Purica\",\"doi\":\"10.1109/SMICND.2008.4703348\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper one type of an electrostatic actuated micromirror structure was simulated using Coventorware software, taking into account the material properties and structure geometry in order to optimize the structure. A characteristic response (displacement versus voltage) for simulated structure is the hysteresis loop of displacement. By reducing the length off the bottom electrode and also the length of the upper isolating layer we can obtain larger displacement of 12 mum. The optimized mirror reflective surface has a size of 120 mum times 120 mum.\",\"PeriodicalId\":6406,\"journal\":{\"name\":\"2008 IEEE International Conference on Semiconductor Electronics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-12-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 IEEE International Conference on Semiconductor Electronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.2008.4703348\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Conference on Semiconductor Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2008.4703348","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
摘要
本文利用Coventorware软件对一种静电驱动微镜结构进行了仿真，考虑了材料特性和结构几何，对结构进行了优化。模拟结构的一个特征响应(位移对电压)是位移的迟滞回线。通过减少底部电极的长度和上部隔离层的长度，我们可以获得更大的12 μ m的位移。优化后的镜面反射面尺寸为120 μ m × 120 μ m。
Design and optimization of an electrostatic actuated micromirror with isolated bottom electrode on silicon substrate
In this paper one type of an electrostatic actuated micromirror structure was simulated using Coventorware software, taking into account the material properties and structure geometry in order to optimize the structure. A characteristic response (displacement versus voltage) for simulated structure is the hysteresis loop of displacement. By reducing the length off the bottom electrode and also the length of the upper isolating layer we can obtain larger displacement of 12 mum. The optimized mirror reflective surface has a size of 120 mum times 120 mum.
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