纳米结构TiN、TiO2单层及TiN/TiO2多层涂层316L SS的阳极腐蚀行为

Saravanan K. Gobi, R. Ananthakumar, B. Subramaniam, S. Maruthamuthu, M. Jayachandran
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引用次数: 0

摘要

以Ar为溅射气体O2、N2为反应气体,采用直流磁控溅射技术制备单层和多层TiN、TiO2薄膜。PVD方法沉积的硬质涂层具有不同的相和晶粒结构,从过渡层到涂层表面一般由柱状晶体组成。电化学极化和阻抗研究结果表明,TiN具有良好的耐蚀性能,其次是TiN/TiO2多层膜、TiO2和未涂覆的316L SS,在添加和不添加氨基酸的人工血浆中具有良好的耐蚀性能。采用血液相容性法分析材料的生物相容性。涂层薄膜的相容性优于未涂层薄膜。TiO2表现出较其它薄膜高的亲水性。通过XRD和AFM对镀层进行了表征。
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Anodic corrosion behavior of nanostructured TiN, TiO2 single layer and TiN/TiO2 multilayer coated 316L SS
Single and multi layer TiN, TiO2 thin films were deposited by DC magnetron sputtering technique using a mixture of Ar as sputtering gas O2, N2 as a reactive gases. The hard coatings deposited by PVD methods can have different phases and grain structures which is generally composed of columnar crystals from the transition layer to the coating surfaces. Results from the electrochemical polarization and impedance studies showed the favorable behavior of the TiN, which have improved the corrosion resistance property followed by TiN/TiO2 multilayer, TiO2 and uncoated 316L SS in presence of artificial blood plasma with and without addition of amino acids. Hemocompatibility was performed to analyze the materials biocompatibility. Coated thin films showed better compatibility than uncoated films. TiO2 exhibited highly hydrophilic in nature than other films. These nanostructure coatings were confirmed by XRD and AFM.
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