A novel low-cost method for fabricating bifacial solar cells

In this work we propose and demonstrate a novel and cost-effective method to fabricate bifacial cells with conventional homojunction architecture. The method combines benefits of lithography-less, self-aligned patterning during deposition of antireflective coating (ARC) and simultaneous metallization of both surfaces aided by electroplating. We have fabricated a conventional diffused n+pp+ junction bifacial solar cell on a monocrystalline silicon (c-Si) substrate using this method. Electrochemically grown nickel is used to simultaneously form front and back electrodes. The bifacial solar cell fabricated with an un-optimized process has a front and rear efficiencies (under AM1.5G one sun illumination) of 12% and 8.66%, respectively. Part of the low performance of the cell is attributed to poor quality of the passivation layer and the post deposition annealing to reduce pinholes in deposited SiNx layer to prevent parasitic plating.