用于大批量应用的低成本lwir波段CMOS红外(CIR)微热计

T. Akin
{"title":"用于大批量应用的低成本lwir波段CMOS红外(CIR)微热计","authors":"T. Akin","doi":"10.1109/MEMS46641.2020.9056383","DOIUrl":null,"url":null,"abstract":"This paper provides an overview of the studies and the current status for the development of a novel, low-cost, and CMOS foundry compatible approach for implementing microbolometers with standard CMOS and simple post-CMOS subtractive MEMS processes. This CMOS infrared detector technology is shortly called as the CMOS IR (CIR) technology, and it can be used to implement Focal Plane Arrays (FPAs) for infrared imaging in the LWIR-band ($8-12\\ \\mu \\mathrm{m}$ wavelength). Post-CMOS processes require only one mask lithography process and simple subtractive etching steps to obtain suspended bulk micromachined microbolometer pixels, where the detector element can be formed with standard CMOS layers and devices such as n-well layers, diodes, polysilicon, and some other CMOS layers and devices. Sensors of various pitch sizes (such as $70\\mu \\mathrm{m},\\ 60\\mu \\mathrm{m}, 50\\mu \\mathrm{m}$, and $35\\mu \\mathrm{m}$) and various FPA formats (such as 160×120, 80×80, and 40×40) have been demonstrated; some of these studies resulted in real commercial products in a VC funded spin-off company. The recent commercial products have a $35\\mu \\mathrm{m}$ pixel pitch implemented using a $0.18\\mu \\mathrm{m}$ CMOS process. One of these is a 80×80 microbolometer FPA has a die size of 5.4mmx6.5 mm and dissipates 20mW; the fabricated sensor is measured to provide NETD values of 163 mK at 17 fps and 71 mK at 4 fps with f/1.0 optics in a dewar, while using only the standard CMOS layers. When this FPA is wafer level vacuum packaged with a silicon cap wafer with one side AR coating, it provides a 112 mK NETD at 4 fps with f/1.1 optics. Another commercial product is the 160×120 FPA, which has a die size of 9.3 mm x 9.1 mm and dissipates less than 50 mW at 30 fps while operating with a 3.3V suppy. The sensor is measured to provide peak NETD values of 161 mK, 117 mK, and 90 mK at 17 fps, 11 fps, and 4 fps, respectively, in a dewar with f/1.0 optics. These performances are more than enough for a number high volume low-cost consumer market applications like advanced presence detection, human counting, smart offices/homes/cities, and other IoT applications. The performances can be improved further by using finer pitch standard CMOS processes as the CIR approach is scalable, allowing to reduce the pixel pitch even further while increasing the array size and/or improving the sensor performance if necessary for automotive, smart phone, and various other low-cost, high volume markets.","PeriodicalId":6776,"journal":{"name":"2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS)","volume":"25 1","pages":"147-152"},"PeriodicalIF":0.0000,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Low-Cost LWIR-Band CMOS Infrared (CIR) Microbolometers for High Volume Applications\",\"authors\":\"T. Akin\",\"doi\":\"10.1109/MEMS46641.2020.9056383\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper provides an overview of the studies and the current status for the development of a novel, low-cost, and CMOS foundry compatible approach for implementing microbolometers with standard CMOS and simple post-CMOS subtractive MEMS processes. This CMOS infrared detector technology is shortly called as the CMOS IR (CIR) technology, and it can be used to implement Focal Plane Arrays (FPAs) for infrared imaging in the LWIR-band ($8-12\\\\ \\\\mu \\\\mathrm{m}$ wavelength). Post-CMOS processes require only one mask lithography process and simple subtractive etching steps to obtain suspended bulk micromachined microbolometer pixels, where the detector element can be formed with standard CMOS layers and devices such as n-well layers, diodes, polysilicon, and some other CMOS layers and devices. Sensors of various pitch sizes (such as $70\\\\mu \\\\mathrm{m},\\\\ 60\\\\mu \\\\mathrm{m}, 50\\\\mu \\\\mathrm{m}$, and $35\\\\mu \\\\mathrm{m}$) and various FPA formats (such as 160×120, 80×80, and 40×40) have been demonstrated; some of these studies resulted in real commercial products in a VC funded spin-off company. The recent commercial products have a $35\\\\mu \\\\mathrm{m}$ pixel pitch implemented using a $0.18\\\\mu \\\\mathrm{m}$ CMOS process. One of these is a 80×80 microbolometer FPA has a die size of 5.4mmx6.5 mm and dissipates 20mW; the fabricated sensor is measured to provide NETD values of 163 mK at 17 fps and 71 mK at 4 fps with f/1.0 optics in a dewar, while using only the standard CMOS layers. When this FPA is wafer level vacuum packaged with a silicon cap wafer with one side AR coating, it provides a 112 mK NETD at 4 fps with f/1.1 optics. Another commercial product is the 160×120 FPA, which has a die size of 9.3 mm x 9.1 mm and dissipates less than 50 mW at 30 fps while operating with a 3.3V suppy. The sensor is measured to provide peak NETD values of 161 mK, 117 mK, and 90 mK at 17 fps, 11 fps, and 4 fps, respectively, in a dewar with f/1.0 optics. These performances are more than enough for a number high volume low-cost consumer market applications like advanced presence detection, human counting, smart offices/homes/cities, and other IoT applications. The performances can be improved further by using finer pitch standard CMOS processes as the CIR approach is scalable, allowing to reduce the pixel pitch even further while increasing the array size and/or improving the sensor performance if necessary for automotive, smart phone, and various other low-cost, high volume markets.\",\"PeriodicalId\":6776,\"journal\":{\"name\":\"2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS)\",\"volume\":\"25 1\",\"pages\":\"147-152\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MEMS46641.2020.9056383\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMS46641.2020.9056383","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

本文概述了一种新型、低成本和CMOS代工厂兼容的方法的研究和发展现状,这种方法可以用标准CMOS和简单的后CMOS减法MEMS工艺实现微辐射热计。这种CMOS红外探测器技术简称为CMOS IR (CIR)技术,可用于实现焦平面阵列(fpa)在lwir波段($8-12\ \mu \ mathm {m}$波长)的红外成像。后CMOS工艺只需要一个掩模光刻工艺和简单的减法蚀刻步骤,就可以获得悬浮体微机械微热计像素,其中探测器元件可以由标准CMOS层和器件(如n阱层、二极管、多晶硅和一些其他CMOS层和器件)组成。各种音高尺寸的传感器(如$70\mu \ mathm {m}、$ 60\mu \ mathm {m}、$ 50\mu \ mathm {m}$和$35\mu \ mathm {m}$)和各种FPA格式(如160×120、80×80和40×40)已被演示;其中一些研究在风投资助的分拆公司中产生了真正的商业产品。最近的商业产品使用$0.18\mu \mathrm{m}$ CMOS工艺实现了$35\mu \mathrm{m}$像素间距。其中之一是80×80微辐射热计FPA的芯片尺寸为5.4mmx6.5 mm,功耗为20mW;在杜瓦瓶中,当仅使用标准CMOS层时,在f/1.0光学条件下,制造的传感器在17 fps和4 fps下的NETD值分别为163 mK和71 mK。当该FPA用单面AR涂层的硅帽晶圆真空封装时,它在4 fps下提供112 mK NETD, f/1.1光学器件。另一个商业产品是160×120 FPA,其芯片尺寸为9.3 mm x 9.1 mm,在使用3.3V电源时,以30 fps的速度耗散小于50 mW。在f/1.0光学度的杜瓦瓶中,该传感器在17 fps、11 fps和4 fps下分别提供了161 mK、117 mK和90 mK的峰值NETD值。这些性能足以满足大量低成本消费市场应用,如高级存在检测、人员计数、智能办公室/家庭/城市和其他物联网应用。由于CIR方法具有可扩展性,因此可以通过使用更精细的间距标准CMOS工艺进一步提高性能,从而进一步降低像素间距,同时增加阵列尺寸和/或提高传感器性能,如果需要的话,适用于汽车,智能手机和各种其他低成本,大批量市场。
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Low-Cost LWIR-Band CMOS Infrared (CIR) Microbolometers for High Volume Applications
This paper provides an overview of the studies and the current status for the development of a novel, low-cost, and CMOS foundry compatible approach for implementing microbolometers with standard CMOS and simple post-CMOS subtractive MEMS processes. This CMOS infrared detector technology is shortly called as the CMOS IR (CIR) technology, and it can be used to implement Focal Plane Arrays (FPAs) for infrared imaging in the LWIR-band ($8-12\ \mu \mathrm{m}$ wavelength). Post-CMOS processes require only one mask lithography process and simple subtractive etching steps to obtain suspended bulk micromachined microbolometer pixels, where the detector element can be formed with standard CMOS layers and devices such as n-well layers, diodes, polysilicon, and some other CMOS layers and devices. Sensors of various pitch sizes (such as $70\mu \mathrm{m},\ 60\mu \mathrm{m}, 50\mu \mathrm{m}$, and $35\mu \mathrm{m}$) and various FPA formats (such as 160×120, 80×80, and 40×40) have been demonstrated; some of these studies resulted in real commercial products in a VC funded spin-off company. The recent commercial products have a $35\mu \mathrm{m}$ pixel pitch implemented using a $0.18\mu \mathrm{m}$ CMOS process. One of these is a 80×80 microbolometer FPA has a die size of 5.4mmx6.5 mm and dissipates 20mW; the fabricated sensor is measured to provide NETD values of 163 mK at 17 fps and 71 mK at 4 fps with f/1.0 optics in a dewar, while using only the standard CMOS layers. When this FPA is wafer level vacuum packaged with a silicon cap wafer with one side AR coating, it provides a 112 mK NETD at 4 fps with f/1.1 optics. Another commercial product is the 160×120 FPA, which has a die size of 9.3 mm x 9.1 mm and dissipates less than 50 mW at 30 fps while operating with a 3.3V suppy. The sensor is measured to provide peak NETD values of 161 mK, 117 mK, and 90 mK at 17 fps, 11 fps, and 4 fps, respectively, in a dewar with f/1.0 optics. These performances are more than enough for a number high volume low-cost consumer market applications like advanced presence detection, human counting, smart offices/homes/cities, and other IoT applications. The performances can be improved further by using finer pitch standard CMOS processes as the CIR approach is scalable, allowing to reduce the pixel pitch even further while increasing the array size and/or improving the sensor performance if necessary for automotive, smart phone, and various other low-cost, high volume markets.
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