10nm通道长度n型无结变势垒纳米线晶体管的研究

Keng-Ming Liu, Sheng-Hong Liao
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引用次数: 1

摘要

本文模拟和研究了一种由无结(JL)栅极全能(GAA)纳米线(NW)晶体管——可变势垒晶体管(VBT)衍生的新型器件结构的器件特性。基本上,VBT是通过JL GAA NW晶体管沟道区域两端的局部收缩来完成的。器件仿真基于三维TCAD器件模拟器Atlas提供的非平衡格林函数(NEGF)方法进行。仿真结果表明,只要设计适当的缩窄(或势垒),JL型VBT可以比JL型GAA NW晶体管具有更大的开/关电流比。
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Investigation on 10-nm channel-length n-type junctionless variable barrier nanowire transistor

In this paper we simulated and investigated the device characteristics of a novel device structure derived from the junctionless (JL) gate-all-around (GAA) nanowire (NW) transistor, variable barrier transistor (VBT). Basically, VBT is accomplished by the local constrictions at both ends of the channel region of the JL GAA NW transistor. The device simulation is performed based on the non-equilibrium Green's function (NEGF) approach provided by the 3D TCAD device simulator, Atlas. The simulation results suggest the JL VBT can have larger ON/OFF current ratio than that of the JL GAA NW transistor as long as the constriction (or barrier) is properly designed.

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