P. Webster, Joe X. Z. Yu, Ben Y. C. Leung, Logan G. Wright, K. Mortimer, J. Fraser
{"title":"激光微加工的在线相干成像","authors":"P. Webster, Joe X. Z. Yu, Ben Y. C. Leung, Logan G. Wright, K. Mortimer, J. Fraser","doi":"10.1109/ISOT.2010.5687305","DOIUrl":null,"url":null,"abstract":"In applications ranging from noncontact microsurgery to semiconductor blind hole drilling, precise depth control of laser processing is a major challenge. Even expensive a priori characterization cannot compensate for material heterogeneity and stochasticity inherent to the ablation process. Here we use in situ depth imaging to guide the machining process in real time. W e image along the machining beam axis at high speeds (up to 300 kHz) to provide real-time feedback, even in high aspect ratio holes. The in situ metrology is based on coherent imaging (similar to optical coherence tomography) and is practical for a wide-range of light sources and machining processes (e.g., thermal cutting or ultrafast nonlinear ablation). Coherent imaging has a high dynamic range (> 60 dB) and strongly rejects incoherent signals allowing weak features to be observed in the presence of intense machining light and plasmas. High axial resolution (∼10 μm) requires broadband imaging light but the center wavelength can be chosen appropriate to the application. Infrared light (wavelength: 1320 ± 35 nm) allows simultaneous monitoring of both surface and subsurface interfaces in non-absorbing materials like tissue and semiconductors. By contrast, silicon based detector technology can be used with near infrared imaging light (805 ± 25 nm) enabling high speed acquisition and low cost implementation.","PeriodicalId":91154,"journal":{"name":"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)","volume":"125 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2010-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Inline coherent imaging of laser micromachining\",\"authors\":\"P. Webster, Joe X. Z. Yu, Ben Y. C. Leung, Logan G. Wright, K. Mortimer, J. Fraser\",\"doi\":\"10.1109/ISOT.2010.5687305\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In applications ranging from noncontact microsurgery to semiconductor blind hole drilling, precise depth control of laser processing is a major challenge. Even expensive a priori characterization cannot compensate for material heterogeneity and stochasticity inherent to the ablation process. Here we use in situ depth imaging to guide the machining process in real time. W e image along the machining beam axis at high speeds (up to 300 kHz) to provide real-time feedback, even in high aspect ratio holes. The in situ metrology is based on coherent imaging (similar to optical coherence tomography) and is practical for a wide-range of light sources and machining processes (e.g., thermal cutting or ultrafast nonlinear ablation). Coherent imaging has a high dynamic range (> 60 dB) and strongly rejects incoherent signals allowing weak features to be observed in the presence of intense machining light and plasmas. High axial resolution (∼10 μm) requires broadband imaging light but the center wavelength can be chosen appropriate to the application. Infrared light (wavelength: 1320 ± 35 nm) allows simultaneous monitoring of both surface and subsurface interfaces in non-absorbing materials like tissue and semiconductors. By contrast, silicon based detector technology can be used with near infrared imaging light (805 ± 25 nm) enabling high speed acquisition and low cost implementation.\",\"PeriodicalId\":91154,\"journal\":{\"name\":\"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)\",\"volume\":\"125 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISOT.2010.5687305\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISOT.2010.5687305","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
In applications ranging from noncontact microsurgery to semiconductor blind hole drilling, precise depth control of laser processing is a major challenge. Even expensive a priori characterization cannot compensate for material heterogeneity and stochasticity inherent to the ablation process. Here we use in situ depth imaging to guide the machining process in real time. W e image along the machining beam axis at high speeds (up to 300 kHz) to provide real-time feedback, even in high aspect ratio holes. The in situ metrology is based on coherent imaging (similar to optical coherence tomography) and is practical for a wide-range of light sources and machining processes (e.g., thermal cutting or ultrafast nonlinear ablation). Coherent imaging has a high dynamic range (> 60 dB) and strongly rejects incoherent signals allowing weak features to be observed in the presence of intense machining light and plasmas. High axial resolution (∼10 μm) requires broadband imaging light but the center wavelength can be chosen appropriate to the application. Infrared light (wavelength: 1320 ± 35 nm) allows simultaneous monitoring of both surface and subsurface interfaces in non-absorbing materials like tissue and semiconductors. By contrast, silicon based detector technology can be used with near infrared imaging light (805 ± 25 nm) enabling high speed acquisition and low cost implementation.