Design and fabrication of 2×2 and 4×4 biaxial micromirror array

This paper presents the design and fabrication of 2×2 and 4×4 biaxial micro-electro-mechanical systems (MEMS) mirror array. The fabrication process was extended from that of previous single micromirror with SW electrodes that bases on silicon-on-insulator (SOI) wafer, hybrid bulk/surface micromachined technology, and a high-aspect-ratio shadow mask. Each mirror plate size is 1000μm×1000μm, thickness 35μm. The gap between mirror plate and bottom electrodes is 300μm. This mirror array is well-suited for application where a large optical aperture is required.