氦离子注入对纳米相和粗晶钛膜结构的影响

Zheng Gao , Yuzun Gao , Yonghong Li , Taisong Zhang , Yi Li
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引用次数: 6

摘要

采用离子束辅助沉积的方法在Mo衬底上制备了纳米钛膜和粗晶钛膜。采用氦离子注入法模拟了氦在钛膜中的行为。将氦离子(100 keV)以5 × 1017/cm2的剂量注入钛膜。利用增强质子反向散射(EPBS)技术检测钛膜注入后的氦残留。利用透射电子显微镜(TEM)研究了钛膜的微观结构和氦气泡的分布。结果表明,在粗晶钛膜中形成了氦泡,其尺寸分布为1 ~ 10 nm,数值密度为5 ~ 25 × 1022/m3。纳米钛膜中未观察到氦泡。对氦泡的形成进行了讨论。
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Effects of helium ion implantation on the structure of nanophase and coarse-grain titanium films

Nanophase and coarse-grain titanium films were prepared on Mo substrates by Ion Beam Assisted Deposition. Ion implantation of helium was used to simulate the behavior of helium in titanium films. Helium ions (100 keV) were implanted into the titanium films with a dose of 5 × 1017/cm2. The retained helium in the titanium films after implantation was detected by Enhanced Proton Back Scattering (EPBS). The microstructure of titanium films and the distribution of helium bubbles were studied by Transmission Electron Microscopy (TEM). It was found that helium bubbles were formed in the coarse-grain titanium films with a size distribution of 1 to 10 nm and a numerical density of 5 to 25 × 1022/m3. No helium bubble was observed in the nanophase titanium films. A discussion is presented for helium bubble formation.

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