过渡金属/铝界面的掠射角XAFS和x射线反射率研究

S. Heald, E. Barrera, H. Chen
{"title":"过渡金属/铝界面的掠射角XAFS和x射线反射率研究","authors":"S. Heald, E. Barrera, H. Chen","doi":"10.1039/DC9908900021","DOIUrl":null,"url":null,"abstract":"The combination of glancing angle X-ray absorption fine structure (XAFS) and X-ray reflectivity measurements provide detailed structural information about interfaces. Results from transition-metal/Al interfaces are used to illustrate the capabilities of the techniques. Reflectivity measurements are used to determine the thickness and density profile of the films, along with the amount of interfacial or surface roughness. The XAFS measurements provide information about the local bonding at the interface, and are well suited for studying the interfacial chemistry. Of interest is the role of impurities such as oxygen in modifying interface structure and thermal stability. For Cu/Al, Ni/Al and Cr/Al a small amount of interfacial oxygen is found to affect strongly both the initial interface structure, and the response of the interface to thermal annealing. For Ni/Al it is also found that interfacial oxygen affects primarily the interface reaction, while oxygen within the Al layer suppresses the grain boundary reaction channel.","PeriodicalId":12210,"journal":{"name":"Faraday Discussions of The Chemical Society","volume":"4 1","pages":"21-30"},"PeriodicalIF":0.0000,"publicationDate":"1990-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":"{\"title\":\"Glancing angle XAFS and X-ray reflectivity studies of transition-metal/aluminium interfaces\",\"authors\":\"S. Heald, E. Barrera, H. Chen\",\"doi\":\"10.1039/DC9908900021\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The combination of glancing angle X-ray absorption fine structure (XAFS) and X-ray reflectivity measurements provide detailed structural information about interfaces. Results from transition-metal/Al interfaces are used to illustrate the capabilities of the techniques. Reflectivity measurements are used to determine the thickness and density profile of the films, along with the amount of interfacial or surface roughness. The XAFS measurements provide information about the local bonding at the interface, and are well suited for studying the interfacial chemistry. Of interest is the role of impurities such as oxygen in modifying interface structure and thermal stability. For Cu/Al, Ni/Al and Cr/Al a small amount of interfacial oxygen is found to affect strongly both the initial interface structure, and the response of the interface to thermal annealing. For Ni/Al it is also found that interfacial oxygen affects primarily the interface reaction, while oxygen within the Al layer suppresses the grain boundary reaction channel.\",\"PeriodicalId\":12210,\"journal\":{\"name\":\"Faraday Discussions of The Chemical Society\",\"volume\":\"4 1\",\"pages\":\"21-30\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Faraday Discussions of The Chemical Society\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1039/DC9908900021\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Faraday Discussions of The Chemical Society","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1039/DC9908900021","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 11

摘要

掠射角x射线吸收精细结构(XAFS)和x射线反射率测量的结合提供了界面的详细结构信息。过渡金属/人工智能界面的结果用于说明该技术的能力。反射率测量用于确定薄膜的厚度和密度分布,以及界面或表面粗糙度的大小。XAFS测量提供了界面上局部键合的信息,非常适合研究界面化学。令人感兴趣的是杂质如氧在改变界面结构和热稳定性方面的作用。对于Cu/Al, Ni/Al和Cr/Al,少量的界面氧对初始界面结构和界面对热退火的响应都有强烈的影响。对于Ni/Al,界面氧主要影响界面反应,而Al层内的氧抑制晶界反应通道。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Glancing angle XAFS and X-ray reflectivity studies of transition-metal/aluminium interfaces
The combination of glancing angle X-ray absorption fine structure (XAFS) and X-ray reflectivity measurements provide detailed structural information about interfaces. Results from transition-metal/Al interfaces are used to illustrate the capabilities of the techniques. Reflectivity measurements are used to determine the thickness and density profile of the films, along with the amount of interfacial or surface roughness. The XAFS measurements provide information about the local bonding at the interface, and are well suited for studying the interfacial chemistry. Of interest is the role of impurities such as oxygen in modifying interface structure and thermal stability. For Cu/Al, Ni/Al and Cr/Al a small amount of interfacial oxygen is found to affect strongly both the initial interface structure, and the response of the interface to thermal annealing. For Ni/Al it is also found that interfacial oxygen affects primarily the interface reaction, while oxygen within the Al layer suppresses the grain boundary reaction channel.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Solvation. List of Posters Energy and structure of the transition states in the reaction OH + CO → H + CO2 Transition-state control of product rotational distributions in H + RH → H2+ R reactions (RH = HCl, HBr, HI, CH4, C2H6, C3H8) Quantum-dynamical characterization of reactive transition states
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1