热退火对反应共溅射制备锰酸镧薄膜结构、光电性能的影响

W. Hourani, C. Rousselot, Kouamé Boko Joël-Igor N’Djoré, A. Billard, M. Arab Pour Yazdi, Y. Makoudi
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引用次数: 0

摘要

在Ar和O2混合气体中,采用共溅射法制备了镧锰酸盐薄膜。薄膜是在硅和熔融硅衬底上合成的。研究了热处理对LMO薄膜结构、光学和电学性能的影响。结果显示了这些性质之间的相关性。在非晶态下,退火温度的升高提高了光传输率,减小了电容。在600°C时开始结晶,表现为电容的强烈增加和光透射率的下降。在较高的退火温度下,得到了具有不同光学和电学特性的多晶薄膜。另一方面,退火后的LMO薄膜在弱LED光照射下表现出光电流效应。
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Thermal Annealing Effect on the Structure, Optical and Electrical Properties of Lanthanum Manganite Thin Films Prepared by Reactive Co-Sputtering
Lanthanum manganite (LMO) thin films were deposited by co-sputtering La and Mn targets in an Ar and O2 gas mixture. The films were synthesized on silicon and fused silica substrates. The influences of thermal annealing on the structure, optical and electrical properties of LMO films were investigated. The results exhibited a correlation between these properties. In the amorphous state, an increase in annealing temperature improved the optical transmission and decreased the electrical capacitance. The beginning of crystallization at 600 °C was manifested by a strong increase in the capacitance and a decrease in the optical transmission. At higher annealing temperature, polycrystalline films were obtained with different optical and electrical characteristics. On the other hand, the annealed LMO films showed a photocurrent effect during exposure to a weak LED light.
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