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引用次数: 0

摘要

研究了低温PVD氧化锆钛酸铅(PZT)薄膜堆在温度和外加电场条件下的泄漏电流衰减。研究表明,降解动力学受工艺条件的影响。对结果的评估提供了对潜在物理的新见解,并允许进一步表征所涉及的缺陷。有人建议将降解动力学的变化解释为材料内平均跳跃距离的改变。这可以推导出所涉及的跳态的有效重叠积分,并标志着对铁电氧化物缺陷的理解又迈出了一步。
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New Insight Into Defects and Degradation Kinetics in Lead Zirconate Titanate
Leakage current degradation in a state-of-the-art integrated low-temperature PVD lead zirconate titanate (PZT) thin film stack is investigated over temperature and applied electric field for samples processed at three different conditions. It is demonstrated that degradation kinetics can be influenced by process conditions. Evaluation of the results provide new insight into the underlying physics and allow for further characterization of involved defects. It is proposed to interpret the change in degradation kinetics as modification of the mean hopping distance within the material. This allows to deduce the effective overlap integral of involved hopping states and marks another step towards understanding of defects in ferroelectric oxides.
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