Ar离子辐照后TiO2/SrTiO3双分子层热电性能的增强

Anuradha Bhogra, Anha Masarrat, R. Meena, Dilruba Hasina, T. Som, K. Asokan
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引用次数: 1

摘要

利用x射线衍射和x射线吸收光谱研究了Ar离子辐照对TiO2/STO双分子层热电性能的影响。在衬底温度为700℃的条件下,采用脉冲激光沉积方法将双层膜沉积在硅衬底上,然后用1 MeV的氩离子束以1×1016 ions/cm2的流量照射。塞贝克系数和电阻率测量采用桥法和双探头测量。结果表明,Ar辐照后双分子层的电阻率显著降低,Seebeck系数显著提高。利用x射线衍射和x射线吸收光谱研究了Ar离子辐照对TiO2/STO双分子层热电性能的影响。在衬底温度为700℃的条件下,采用脉冲激光沉积方法将双层膜沉积在硅衬底上,然后用1 MeV的氩离子束以1×1016 ions/cm2的流量照射。塞贝克系数和电阻率测量采用桥法和双探头测量。结果表明,Ar辐照后双分子层的电阻率显著降低,Seebeck系数显著提高。
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Enhancement of thermoelectric properties of TiO2/SrTiO3 bilayer after Ar ion irradiation
The Ar ion irradiation induced effects in thermoelectric properties of TiO2/STO bilayer have been investigated by X-ray Diffraction, alongwith X-ray Absorption spectroscopy. The bilayer was deposited on silicon substrate by Pulsed laser deposition at a substrate temperature of 700°C and then irradiated by using 1 MeV Ar ion beam at a fluence of 1×1016 ions/cm2. The Seebeck coefficient and resistivity measurements were performed by the bridge method and two probe measurements. It was found that resistivity of the bilayer drastically reduces after Ar irradiation and Seebeck coefficient enhances significantly compared to the bulk SrTiO3.The Ar ion irradiation induced effects in thermoelectric properties of TiO2/STO bilayer have been investigated by X-ray Diffraction, alongwith X-ray Absorption spectroscopy. The bilayer was deposited on silicon substrate by Pulsed laser deposition at a substrate temperature of 700°C and then irradiated by using 1 MeV Ar ion beam at a fluence of 1×1016 ions/cm2. The Seebeck coefficient and resistivity measurements were performed by the bridge method and two probe measurements. It was found that resistivity of the bilayer drastically reduces after Ar irradiation and Seebeck coefficient enhances significantly compared to the bulk SrTiO3.
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