硒处理对四元靶溅射多晶CuIn1−xGaxSe2薄膜的影响

Chuan Chang, Chia-Hao Hsu, W. Ho, Shih-yuan Wei, Yue-Shun Su, C. Lai
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引用次数: 0

摘要

在这项工作中,为了钝化引起电流阻塞行为和降低开路电压的阴离子缺陷,研究了在250-350°C下对四元靶溅射的多晶CuIn1-xGaxSe2 (CIGS)薄膜进行硒处理。CIGS薄膜在封闭空间石墨容器中硒化。用拉曼光谱、EQE和电流-电压-温度测量对硒化结果进行了表征。在350℃硒化后,阻流行为被抑制,Voc从310mV增加到640mV。到目前为止,通过优化硒化工艺可以获得接近9%的效率。
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Selenium treatment on the polycrystalline CuIn1−xGaxSe2 thin films sputtered from a quaternary target
In this work, selenium treatment at 250-350°C on the polycrystalline CuIn1-xGaxSe2 (CIGS) thin films sputtered from a quaternary target has been investigated in order to passivate anionic defects which induce the current-blocking behavior and lowering open circuit voltage. The CIGS thin films were selenized in a closed-space graphite container. The result of selenization was characterized by Raman spectroscopy, EQE and the current-voltage-temperature measurement. After selenization at 350°C, the current-blocking behavior is inhibited and Voc increases from 310mV to 640mV. Until now, the efficiency near 9% can be obtained by an optimized selenization process.
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