溶胶-凝胶自旋涂覆铟掺杂氧化镉薄膜的结构和电学性能

R. Rajammal, E. Savarimuthu, S. Arumugam
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引用次数: 0

摘要

采用溶胶-凝胶自旋镀膜技术制备了掺杂铟的CdO薄膜,研究了掺杂铟浓度对薄膜结构和电学性能的影响。溶液中的铟掺杂浓度从0- 10wt %到2wt%不等。发现铟掺杂浓度为6wt%是制备薄膜的最佳条件,在此阶段实现了最小电阻率为5.92×10−4Ω cm和最大载流子浓度为1.20×1020cm−3。
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Structural and electrical properties of sol-gel spin coated indium doped cadmium oxide thin films
The indium doped CdO thin films have been prepared by the sol-gel spin coating technique and the influence of indium doping concentration on the structural and electrical properties of the deposited films has been investigated. The indium doping concentration in the solution has been varied from 0-10 wt% insteps of 2wt%. A indium doping concentration of 6wt% has been found to be optimum for preparing the films and at this stage a minimum resistivity of 5.92×10−4Ω cm and a maximum carrier concentration of 1.20×1020cm−3 have been realized.
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