绝缘子中的注入电流

M. Lampert
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引用次数: 89

摘要

综述了单载流子和双载流子体积控制注入电流的基本原理。单载流子注入电流必然是空间电荷有限的,并且受到陷阱的强烈影响,陷阱通常会捕获和固定大多数注入载流子。捕获的载流子与自由注入的载流子处于有效的热平衡。定义了“浅”和“深”陷阱的概念,并研究了它们对注入电流的影响。结果表明,在适当的电压下,“深”陷阱的存在导致电流随电压急剧上升,类似击穿曲线。在双注入下,即同时从阴极向绝缘体注入电子和从阳极同时注入空穴,至少部分克服了空间电荷限制,但注入载流子的复合对电流产生了新的限制。在任何绝缘体中,在足够高的注入水平下,重组和空间电荷都有助于限制电流,导致单分子重组过程中电流依赖于电压的立方。对于双注入到半导体中,热生成的自由载流子的存在导致电荷中性(所谓的欧姆弛豫过程),而复合本身就限制了电流。在与扩散长度相比较的半导体中,这导致电流依赖于电压的平方。
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Injection Currents in Insulators
The basic principles of one- and two-carrier, volume-controlled injection currents are reviewed. One-carrier injected currents are necessarily space-charge-limited and are strongly affected by the presence of traps which usually capture and immobilize most of the injected carriers. The trapped carriers are in an effective thermal equilibrium with the free injected carriers. The concepts of "shallow" and "deep" traps are defined and their effects on injected currents studied. It is shown that the presence of "deep" traps leads to a very steep rise of current with voltage, resembling a breakdown curve, at an appropriate voltage. Under double injection, that is, the simultaneous injection into the insulator of electrons from a cathode and holes from an anode, space-charge limitations are at least partially overcome but recombination of injected carriers presents a new limitation on the current flow. In any insulator at sufficiently high injection levels both recombination and space charge contribute to limitation of the current, leading to a dependence of current on the cube of the voltage, for monomolecular recombination processes. For double injection into a semiconductor, the presence of thermally generated free carriers leads to charge neutrality (the so-called ohmic relaxation process) and recombination alone limits the current. In a semiconductor long compared to a diffusion length this leads to a dependence of current on the square of the voltage.
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