电子束辐照对cu6ps5i基超离子薄膜光学性能的影响

V. Izai, A. Bendak, I. Haysak, A. G. Okunyev, A. Fradkin, I. Studenyak, P. Kúš
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引用次数: 0

摘要

采用非反应性射频磁控溅射技术在硅酸盐玻璃衬底上沉积cu6ps5i基薄膜。利用电子通量测量了电子束辐照cu6ps5i基薄膜的透射光谱。随着电子能量的增加,透射光谱中短波段的红移和干涉最大值增大。研究了电子束辐照cu6ps5i基薄膜的厄巴赫吸收边和折射率色散。在电子束辐照作用下,材料的能量赝隙减小,乌尔巴赫能和折射率增大。分析了电子束辐照对cu6ps5i基薄膜光学参数和无序过程的影响。
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Influence of e-beam irradiation on optical properties of Cu6PS5I-based superionic thin films
Cu6PS5I-based thin films were deposited by nonreactive radio frequency magnetron sputtering onto silicate glass substrates. Optical transmission spectra of e-beam irradiated Cu6PS5I-based thin films were measured depending on electron fluence. With electron fluence increase the red shift of the short-wavelengt part of transmission spectra and interference maxima were observed. Urbach absorption edge and dispersion of refractive index for e-beam irradiated Cu6PS5I-based thin films were studied. Under the influence of e-beam irradiation the decrease of the energy pseudogap as well as the increase of the Urbach energy and refractive index were revealed. Influence of e-beam irradiation on the optical parameters and disordering processes in Cu6PS5I-based thin films was analyzed.
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