MASWP: Duo_Plasmaline下一代的应用

L. Alberts, M. Kaiser, C. Hunyar, M. Graf, K. Nauenburg, E. Rauchle
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引用次数: 0

摘要

只提供摘要形式。基于微波的表面波等离子体反应器,如那些依赖于双等离子体的反应器,在介质涂层应用中取得了巨大的成功。但它们在电介质材料的应用上存在主要的局限性。在此,我们尝试提出一种基于金属天线SWP的双plasmaline NG。这种设计将绕过介电涂层的限制。等离子体的传播长度将作为气体压力、微波功率和不同大气(如氩气、氮气和氧气)的偏置电位的函数进行报道。等离子体均匀性将反映在沿天线的PECVD薄膜的涂层厚度演变中。
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Application of a MASWP: Duo_Plasmaline next generation
Summary form only given. Microwave based surface wave plasma reactors like those relying on the Duo-Plasmaline encounters large success in dielectric coating applications. But they show principal limitation to dielectric materials applications. We attempt here to present a Duo-Plasmaline NG based on the metal antenna SWP. This design would circumvent the dielectric coating limitation. The propagation length of the plasma will be reported as a function of gas pressure, microwave power and bias potential for different atmospheres like argon, nitrogen and oxygen. The plasma homogeneity will be reflected in the coating thickness evolution of a PECVD thin film along the antenna.
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