{"title":"用Mueller矩阵椭偏法测量纳米尺度光栅结构","authors":"Shiqiu Cheng, Fengjiao Zhong, Huiping Chen, Y. Jia, Yaoming Shi, Yiping Xu","doi":"10.1109/CSTIC.2017.7919855","DOIUrl":null,"url":null,"abstract":"Spectroscopic ellipsometry technology has extensive applications in semiconductor metrology. Compared with spectroscopic ellipsometry, the Mueller matrix ellipsometry can acquire more useful information about the sample. In this paper, we present the construction of Mueller measurement equipment for 300 mm integrated circuit production line application and demonstrate the abilities of the equipment for accurate profile characterization of nanoscale structure. Mueller matrix ellipsometry may become a powerful technology for advanced technology node measurement in semiconductor device manufacturing applications.","PeriodicalId":6846,"journal":{"name":"2017 China Semiconductor Technology International Conference (CSTIC)","volume":"8 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2017-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Measurement of nanoscale grating structure by Mueller matrix ellipsometry\",\"authors\":\"Shiqiu Cheng, Fengjiao Zhong, Huiping Chen, Y. Jia, Yaoming Shi, Yiping Xu\",\"doi\":\"10.1109/CSTIC.2017.7919855\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Spectroscopic ellipsometry technology has extensive applications in semiconductor metrology. Compared with spectroscopic ellipsometry, the Mueller matrix ellipsometry can acquire more useful information about the sample. In this paper, we present the construction of Mueller measurement equipment for 300 mm integrated circuit production line application and demonstrate the abilities of the equipment for accurate profile characterization of nanoscale structure. Mueller matrix ellipsometry may become a powerful technology for advanced technology node measurement in semiconductor device manufacturing applications.\",\"PeriodicalId\":6846,\"journal\":{\"name\":\"2017 China Semiconductor Technology International Conference (CSTIC)\",\"volume\":\"8 1\",\"pages\":\"1-3\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 China Semiconductor Technology International Conference (CSTIC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CSTIC.2017.7919855\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 China Semiconductor Technology International Conference (CSTIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSTIC.2017.7919855","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Measurement of nanoscale grating structure by Mueller matrix ellipsometry
Spectroscopic ellipsometry technology has extensive applications in semiconductor metrology. Compared with spectroscopic ellipsometry, the Mueller matrix ellipsometry can acquire more useful information about the sample. In this paper, we present the construction of Mueller measurement equipment for 300 mm integrated circuit production line application and demonstrate the abilities of the equipment for accurate profile characterization of nanoscale structure. Mueller matrix ellipsometry may become a powerful technology for advanced technology node measurement in semiconductor device manufacturing applications.
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