回归移民的自我选择:印度发明家的证据

Stefano Breschi, F. Lissoni, Ernest Miguelez
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引用次数: 9

摘要

基于一个原始数据集,该数据集连接了大量具有印度姓氏的美国移民发明家的专利数据和传记信息,这些人专门从事ICT技术,我们调查了返回移民的比率和决定因素。对于数据集中的每个人,我们都估计了进入美国的年份,可能的进入渠道(工作或教育),以及永久拼写到返回印度或右截断。通过生存分析,我们提供了返回迁移概率的探索性估计,作为迁移条件(年龄、教育、专利记录、迁移动机和迁移队列)的函数,以及在国外进行的一些活动(教育和专利)。我们发现在美国教育成就方面存在消极自我选择的证据,在专利倾向方面存在积极自我选择的证据。根据对回国风险比的时间依赖性分析,回国务工移徙者在国外获得的不可观察的技能方面似乎是消极的自我选择,而教育移徙者的证据则不那么确凿。
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Return Migrants' Self-Selection: Evidence for Indian Inventors
Based on an original dataset linking patent data and biographical information for a large sample of US immigrant inventors with Indian names and surnames, specialized in ICT technologies, we investigate the rate and determinants of return migration. For each individual in the dataset, we both estimate the year of entry in the United States, the likely entry channel (work or education), and the permanence spell up to either the return to India or right truncation. By means of survival analysis, we then provide exploratory estimates of the probability of return migration as a function of the conditions at migration (age, education, patenting record, migration motives, and migration cohort) as well as of some activities undertaken while abroad (education and patenting). We find both evidence of negative self-selection with respect to educational achievements in the US and of positive self-selection with respect to patenting propensity. Based on the analysis of time-dependence of the return hazard ratios, return work migrants appear to be negatively self-selected with respect to unobservable skills acquired abroad, while evidence for education migrants is less conclusive.
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