S. Gunjal, Y. Khollam, R. R. Udawant, S. Jadkar, P. Shelke, J. Sali, K. Mohite
{"title":"超声喷雾热解p-CdTe薄膜的光学和电学性质","authors":"S. Gunjal, Y. Khollam, R. R. Udawant, S. Jadkar, P. Shelke, J. Sali, K. Mohite","doi":"10.1109/ICANMEET.2013.6609308","DOIUrl":null,"url":null,"abstract":"The p-CdTe films are prepared on thoroughly cleaned glass substrates by using ultrasonic spray pyrolysis techniques in-situ reducing atmosphere with air-ambient at 548 and 573 K. The resultant films are characterized by using X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray (EDAX) analysis, UV-Visible spectroscopy and Hall measurement set-up. The characterization studies revealed crystallization of the main p-CdTe phase with minor oxidation corresponding to TeO2 in resultant films. The uniform size distribution of spherical particles with average particle size = 0.2 μm is noted from SEM studies. The optical properties are found to be absorbance (α) = 0.80 and band gap (Eg) = 1.46 eV for the films prepared at 573 K. The less oxidation at higher processing temperature realized in XRD and EDAX studies might be due to higher crystallization rate of p-CdTe dominating the oxidation. The Hall coefficient, RH = 0.0205 × 104 cm3/C, resistivity, r = 0.5812 × 102 Ω-cm and negative current value in Hot probe experiment indicated p-type semiconductor nature of resultant films processed at 573 K. The higher concentration (n), and less mobility (μ) of majority charge carriers for the films processed at 573 K might be due to less oxidation at higher temperature.","PeriodicalId":13708,"journal":{"name":"International Conference on Advanced Nanomaterials & Emerging Engineering Technologies","volume":"114 1","pages":"360-362"},"PeriodicalIF":0.0000,"publicationDate":"2013-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Optical and electrical properties of ultrasonic spray pyrolysized p-CdTe films\",\"authors\":\"S. Gunjal, Y. Khollam, R. R. Udawant, S. Jadkar, P. Shelke, J. Sali, K. Mohite\",\"doi\":\"10.1109/ICANMEET.2013.6609308\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The p-CdTe films are prepared on thoroughly cleaned glass substrates by using ultrasonic spray pyrolysis techniques in-situ reducing atmosphere with air-ambient at 548 and 573 K. The resultant films are characterized by using X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray (EDAX) analysis, UV-Visible spectroscopy and Hall measurement set-up. The characterization studies revealed crystallization of the main p-CdTe phase with minor oxidation corresponding to TeO2 in resultant films. The uniform size distribution of spherical particles with average particle size = 0.2 μm is noted from SEM studies. The optical properties are found to be absorbance (α) = 0.80 and band gap (Eg) = 1.46 eV for the films prepared at 573 K. The less oxidation at higher processing temperature realized in XRD and EDAX studies might be due to higher crystallization rate of p-CdTe dominating the oxidation. The Hall coefficient, RH = 0.0205 × 104 cm3/C, resistivity, r = 0.5812 × 102 Ω-cm and negative current value in Hot probe experiment indicated p-type semiconductor nature of resultant films processed at 573 K. The higher concentration (n), and less mobility (μ) of majority charge carriers for the films processed at 573 K might be due to less oxidation at higher temperature.\",\"PeriodicalId\":13708,\"journal\":{\"name\":\"International Conference on Advanced Nanomaterials & Emerging Engineering Technologies\",\"volume\":\"114 1\",\"pages\":\"360-362\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-07-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Advanced Nanomaterials & Emerging Engineering Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICANMEET.2013.6609308\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Advanced Nanomaterials & Emerging Engineering Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICANMEET.2013.6609308","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Optical and electrical properties of ultrasonic spray pyrolysized p-CdTe films
The p-CdTe films are prepared on thoroughly cleaned glass substrates by using ultrasonic spray pyrolysis techniques in-situ reducing atmosphere with air-ambient at 548 and 573 K. The resultant films are characterized by using X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray (EDAX) analysis, UV-Visible spectroscopy and Hall measurement set-up. The characterization studies revealed crystallization of the main p-CdTe phase with minor oxidation corresponding to TeO2 in resultant films. The uniform size distribution of spherical particles with average particle size = 0.2 μm is noted from SEM studies. The optical properties are found to be absorbance (α) = 0.80 and band gap (Eg) = 1.46 eV for the films prepared at 573 K. The less oxidation at higher processing temperature realized in XRD and EDAX studies might be due to higher crystallization rate of p-CdTe dominating the oxidation. The Hall coefficient, RH = 0.0205 × 104 cm3/C, resistivity, r = 0.5812 × 102 Ω-cm and negative current value in Hot probe experiment indicated p-type semiconductor nature of resultant films processed at 573 K. The higher concentration (n), and less mobility (μ) of majority charge carriers for the films processed at 573 K might be due to less oxidation at higher temperature.