晶圆级,通过化学浴沉积的ZnO纳米线排列良好:锌离子贡献和其他限制因素的评估

A. Gokarna, Yu-Chen Huang, Junze Zhou, K. Nomenyo, R. Ionescu, G. Lerondel
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Wafer-scale, well-aligned growth of ZnO nanowires via chemical bath deposition: Assessment of Zinc ions contribution and other limiting factors
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