深亚微米时代一种新颖的高性能可预测电路架构

Yonghee Im, K. Roy
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引用次数: 1

摘要

目前的VLSI设计技术主要关注四个主要目标:更高的集成度、更快的速度、更低的功耗和更短的上市时间。这些目标主要是通过深亚微米技术和电压缩放来实现的。然而,缩小特征尺寸会导致更大的线间电容,从而导致相关互连之间的大串扰。我们目前面临着前所未有的信号完整性问题,因此在某些输入条件下电路的准确功能可预测性可能会受到质疑,更不用说性能和功耗的可预测性了。在本文中,我们提出了一种新的可预测电路结构,称为基于优化覆盖阵列的结构(O/sup 2/ABA),特别适合于深亚微米区域。O/sup 2/ABA通过考虑电流方向和减小线间电容来实现串扰的减小。单元格的引入带来了高度的规律性,这使得在布局之前就可以预测性能,并缩短了设计时间。O/sup 2/ABA与其他设计风格,如定制设计、PLA和Weinberger阵列进行了比较,以显示其优势。
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A novel high-performance predictable circuit architecture for the deep sub-micron era
Current VLSI design techniques focus on four major goals: higher integration, faster speed, lower power, and shorter time-to-market. Those goals have been accomplished mainly by deep sub-micron technology along with voltage scaling. However, scaling down feature size causes larger interwire capacitance which is responsible for large crosstalk between concerned interconnects. We are currently facing signal integrity problems never experienced before, such that accurate function predictability of circuits under certain input conditions may be questionable, not to mention performance and power dissipation predictability. In this paper we suggest a novel predictable circuit architecture, named optimized overlaying array based architecture (O/sup 2/ABA), especially suited for the deep sub-micron regime. O/sup 2/ABA achieves reduction of crosstalk by considering the current directions and by reducing interwire capacitance. The introduction of unit cell leads to high regularity, which makes the performance predictable even before layout, and shortens time-to-design. O/sup 2/ABA is compared with other design styles, such as custom design, PLA and Weinberger array, to show its advantages.
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