从SEM/TEM/STEM图像中自动测量集成电路轮廓参数的有效方法

Xiaolin Zhang, Zubiao Fu, Yi Huang, Alien Lin, Yaoming Shi, Yiping Xu
{"title":"从SEM/TEM/STEM图像中自动测量集成电路轮廓参数的有效方法","authors":"Xiaolin Zhang, Zubiao Fu, Yi Huang, Alien Lin, Yaoming Shi, Yiping Xu","doi":"10.1109/CSTIC.2017.7919843","DOIUrl":null,"url":null,"abstract":"An effective image based method to automatically measure the profile parameters (PPs), including the critical dimensions (CDs), the full height and other structural parameters, of the integrated circuit (IC) devices in batch is proposed. In this method, templates are used to indicate the patterns of interest and the regions of the desired PPs; pattern recognition and PPs analysis algorithms are applied to determine the exact PPs from the underdetermined IC device images. In practice, the proposed method was proven of higher efficiency, more accuracy and better repeatability than the traditional manual measurement.","PeriodicalId":6846,"journal":{"name":"2017 China Semiconductor Technology International Conference (CSTIC)","volume":"11 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2017-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effective method to automatically measure the profile parameters of integrated circuit from SEM/TEM/STEM images\",\"authors\":\"Xiaolin Zhang, Zubiao Fu, Yi Huang, Alien Lin, Yaoming Shi, Yiping Xu\",\"doi\":\"10.1109/CSTIC.2017.7919843\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An effective image based method to automatically measure the profile parameters (PPs), including the critical dimensions (CDs), the full height and other structural parameters, of the integrated circuit (IC) devices in batch is proposed. In this method, templates are used to indicate the patterns of interest and the regions of the desired PPs; pattern recognition and PPs analysis algorithms are applied to determine the exact PPs from the underdetermined IC device images. In practice, the proposed method was proven of higher efficiency, more accuracy and better repeatability than the traditional manual measurement.\",\"PeriodicalId\":6846,\"journal\":{\"name\":\"2017 China Semiconductor Technology International Conference (CSTIC)\",\"volume\":\"11 1\",\"pages\":\"1-3\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 China Semiconductor Technology International Conference (CSTIC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CSTIC.2017.7919843\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 China Semiconductor Technology International Conference (CSTIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSTIC.2017.7919843","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

提出了一种有效的基于图像的成批集成电路(IC)器件轮廓参数(PPs)自动测量方法,包括关键尺寸(cd)、全高和其他结构参数。在这种方法中,模板用于指示感兴趣的模式和所需pp的区域;应用模式识别和PPs分析算法从欠确定的IC器件图像中确定准确的PPs。实践证明,与传统的人工测量相比,该方法具有更高的效率、更高的精度和更好的重复性。
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Effective method to automatically measure the profile parameters of integrated circuit from SEM/TEM/STEM images
An effective image based method to automatically measure the profile parameters (PPs), including the critical dimensions (CDs), the full height and other structural parameters, of the integrated circuit (IC) devices in batch is proposed. In this method, templates are used to indicate the patterns of interest and the regions of the desired PPs; pattern recognition and PPs analysis algorithms are applied to determine the exact PPs from the underdetermined IC device images. In practice, the proposed method was proven of higher efficiency, more accuracy and better repeatability than the traditional manual measurement.
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