纳米结构镍的晶粒生长动力学

M.C Iordache , S.H Whang , Z Jiao , Z.M Wang
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引用次数: 67

摘要

采用等温、等时退火和透射电镜等手段研究了纳米镍的晶粒生长动力学。等温等时退火的温度范围选择在603K ~ 683K之间。晶粒尺寸等温曲线表明,在退火初期晶粒出现爆发性生长,但在600 nm以上晶粒尺寸恢复正常生长。用透射电镜观察了退火后试样的显微组织变化。由晶粒生长率与1/T比值图可知,晶粒生长的活化能为102 kJ/mol,与晶界扩散的活化能相当。从晶粒尺寸差随退火时间的变化曲线中得到时间指数,其变化范围为1/6 ~ 1/7。
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Grain growth kinetics in nanostructured nickel

Grain growth kinetics for nanostructured nickel was studied by means of isothermal and isochronal annealing and TEM. The range of temperature for the isothermal and isochronal annealing has been selected between 603K and 683K. The isothermal curves for grain size show that an explosive grain growth occurs in the early stage of annealing, but the growth returns normal beyond grain size of 600 nm. The change in microstructure in the annealed specimens has been investigated by TEM. The activation energy for the grain growth was found to be 102 kJ/mol from the plot of grain growth rate vs. 1/T, which is comparable to the activation energy for diffusion at the grain boundaries. The time exponent was obtained from the plot of grain size difference vs. annealing time, and found to be in the range of 1/6–1/7.

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