Parametric Investigation of Photochemical Machining of SS- 430 for Manufacturing of Micromesh

Photochemical machining (PCM) is an emerging method for machining of very thin and difficult-to-cut material with complex geometrical profile. PCM is one of recommended method for machining of aerospace components, biomedical appliances, electronics part and decorative items. High corrosion resistance, better life, good appearance and strength recommend SS-430 as suitable material for various applications. In the current investigation, the parametric investigations of process parameters in photochemical machining for concentration and temperature of etchant, time of etching is done through ANOVA analysis. Grey Relational Analysis is performed to estimate the optimum machining parameters during PCM of SS-430. Formulation of mathematical model is done for prediction of results. Taguchi (L27) experimental array is used for Design of Experiments (DoE). The significance process parameters are estimated to govern the process with F-Values. Confirmatory test is conducted to observe the improvement in the responses. ANN predictive model is built up for investigation of error between predictive and experimental values. The obtained optimum set is used for manufacturing of micromesh typically used in smoke detector to safeguard human life.