28GHz功率放大器,23.5 dBm Psat, 65nm SOI CMOS

Dongliang Ni, Liang-Hui Li, Weijia Wu, Jiwei Huang
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摘要

本文设计了一种基于65纳米绝缘体上硅(Silicon-On-Insulator, SOI) CMOS技术的28GHz双级差分功率放大器(PA)。每个放大器单元都设计为高线性度,同时保持高增益。为了提供足够的输出功率,功率级采用差分级联结构,驱动级采用差分共源拓扑,以提高功率增益。在差分电路中,通过增加中和电容来补偿晶体管栅漏电容的寄生效应,从而提高增益,同时采用电感退化技术来提高线性度。通过变压器实现阻抗匹配网络,通过耦合线路平衡实现低损耗信号的分配和组合。仿真结果表明,该系统在28 ghz频段的饱和输出功率为23.5dBm,功率附加效率(PAE)为45.7%;1dB压缩输出功率为21.3 dBm,增益为14.5 dB。功率放大器的布局尺寸为0.46 mm2,核心面积为0.252 mm2。
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A 28GHz Power Amplifier with 23.5 dBm Psat in 65nm SOI CMOS
In this paper, a 28GHz two-stage differential power amplifier (PA) with two-way power combining is designed in 65-nm Silicon-On-Insulator (SOI) CMOS technology. Each PA cell is designed for high linearity while maintaining high gain. To provide adequate output power, differential cascode structure is selected for power stage, while the driver stage adopts differential common source topology for boosting the power gain. In the differential circuit, neutralization capacitor is added to compensate the parasitic effect of gate-to-drain capacitor of the transistor to improve the gain, while the inductive degeneration technique is adopted to increases the linearity. The impedance matching networks is implemented by transformers, low loss signal distribution and combining are achieved by coupling line balun. The simulation results demonstrate a 23.5dBm PA saturated output power with 45.7% Power-Added Efficiency (PAE) at 28-GHz, while the 1-dB compression output power (P1dB) of 21.3 dBm, and gain of 14.5 dB. The layout size of the power amplifier is 0.46 mm2, and the core area is 0.252 mm2.
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