氮气加压烧结对氮化硅表面和强度的影响

N. Hirosaki, A. Okada
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引用次数: 7

摘要

测定了具有烧结表面的Si{sub 3}N{sub 4}的抗弯强度,探讨了烧结气氛对表面的影响。在0.1 MPa N{sub 2}(无压烧结)条件下,Si{sub 3}N{sub 4}与添加剂氧化物发生热分解反应,形成近表面空洞,烧结强度下降至地面强度的39%。然而,在70 MPa N{sub 2}(气压烧结)下,Si{sub 3}N{sub 4}的烧结强度保留了高达76%的地面强度。这一结果似乎表明,高压N{sub 2}气体通过减少分解反应抑制了孔隙的形成。气压烧结在避免热分解和保持较高的烧结强度方面是有效的。
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Effects of N sub 2 gas pressure sintering on the surface and strength of Si sub 3 N sub 4
The flexural strength of Si{sub 3}N{sub 4} having an as-sintered surface was measured to investigate the effects of the sintering atmosphere on the surface. The as-sintered strength of Si{sub 3}N{sub 4} fires in 0.1 MPa N{sub 2} (pressureless sintering) degraded to 39% of its ground strength as a result of near-surface voids formed by thermal decomposition reactions between Si{sub 3}N{sub 4} and additive oxides. The as-sintered strength of Si{sub 3}N{sub 4} fired at 70 MPa N{sub 2} (gas pressure sintering), however, was shown to retain as much as 76% of its ground strength. This result seems to indicate that high-pressure N{sub 2} gas suppressed the void formation by reducing the decomposition reactions. Gas pressure sintering was effective in avoiding thermal decomposition and in maintaining a higher as-sintered strength.
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