用于高温操作实验和建模的1.3µm InGaAsP/InP MQW激光器

G. Belenky, D. Donetsky, C. Reynolds, G. Shtengel, R. Kazarinov, S. Luryi
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引用次数: 0

摘要

我们在10 - 80°C的温度范围和10 kA/cm2的注入电流密度范围内,对具有9 QW有源区和不同p掺杂谱线的InGaAsP/InP激光器进行了生长、制造、表征和建模。对广域和封顶台面埋置异质结构器件进行了阈值电流、外部效率和光损耗的测量。我们使用在p-触点顶部带有电子收集器的广域器件进行泄漏测量[1],并使用改进的Andrekson技术来测量光损耗。采用基于漂移-扩散近似的“Padre”程序进行模拟。实验表明,对于中等掺杂SCH的器件,室温下阈值电流达到115a /cm2 / QW, T0 = 64K(图1)。
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1.3 µm InGaAsP/InP MQW Lasers for High Temperature Operation Experiment and Modeling
We carried out growth, fabrication, as well as characterization and modeling of InGaAsP/InP lasers with 9 QW active region and different p-doping profiles within the temperature range of 10 - 80 °C and the range of injection current densities up to 10 kA/cm2. Measurements of the threshold current, external efficiency, and optical loss were carried out for broad area and capped mesa buried heterostructure devices. We used broad area devices with electron collector on the top of p-contact for leakage measurements [1] and a modified Andrekson technique to measure optical loss. For simulation we used “Padre” program based on drift-diffusion approximation. Experiment shows that for devices with moderately doped SCH, the threshold current at room temperature reaches the value of 115 A/cm2 per QW and T0 = 64K (Fig.1).
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