Ni/4H-SiC肖特基二极管低能电子辐射前后的电学模拟

Sabuhi Ganiyev, N. Muridan, N. Hasbullah, Y. Abdullah
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引用次数: 4

摘要

本文模拟研究了低能电子辐射和高温对Ni/4H-SiC肖特基二极管电流-电压特性的影响。利用Silvaco Atlas technology计算机辅助设计(TCAD)仿真工具,基于热离子发射理论模拟了Ni/4H-SiC肖特基二极管的I-V特性。研究发现,高压下正向偏置电流的减小是由于串联电阻的增大。而反向偏置(RB)电流在辐照后没有变化。从298-448开尔文(K)温度范围内的温度依赖性I-V可知,肖特基势垒高度Φb、饱和电流Is和串联电阻Rs与温度有关,而理想因子n保持不变。
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Electrical simulation of Ni/4H-SiC Schottky diodes before and after low energy electron radiation
In this paper simulation on the effects of low energy electron radiation and high temperature on the current-voltage (I-V) characteristics of Ni/4H-SiC Schottky diode were investigated. I-V characteristics of the Ni/4H-SiC Schottky diode were simulated based on thermionic emission theory using Silvaco Atlas Technology-computer-aided-design (TCAD) simulation tool. It was found the decrease in the forward bias (FB) current at high voltages is due to the increase of series resistance. However, reverse bias (RB) current did not change after radiation. From the temperature dependence I-V ranging from temperature range of 298-448 Kelvin (K), the schottky barrier height Φb, saturation current Is and series resistance Rs are found to be temperature dependent, while ideality factor n remained constant.
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