On Approach for Prognosis of Influence of Mismatch-induced Stresses on the I–V Characteristics of p-n-junctions Manufactured in a Heterostructure

We consider a nonlinear model for analysis of current-voltage characteristic of a p-n-junction, which was manufactured in the framework of a heterostructure with specific configuration by diffusion or ion implantation. We analyzed the model to obtain dependence of the considered current-voltage characteristic on missmatch-induced stresses in the framework of the heterostructure. We also consider an analytical approach for analysis of mass and heat transport during the considered processes with account their nonlinearity and missmatch induced stresses as well changes of parameters of these in space and time.