前真空等离子体电子源研究进展

E. Oks
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摘要

只提供摘要形式。本文综述了在10- 100pa压力范围内工作的所谓“前真空等离子体电子源”的物理和性能的最新进展。获得了电子束的一些独特参数,如电子直流能量(至20 keV),直流束流电流(高达0.5 A),脉冲电流(高达100A, 1 ms)和总电子束功率(高达5 kW)。对于在这些相对较高的压力下产生电子束,以下特殊特征是重要的:在加速间隙内电击穿的高概率,发射电极和发射等离子体的回流离子的强烈影响,在光束传播区域产生二次等离子体,以及强烈的光束-等离子体相互作用,从而导致光束能谱的扩大和光束的散焦。介绍了几种前泵等离子体电子源及其性能和参数。主要应用领域是非导电高温陶瓷的电子束处理。
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Recent development of the fore-vacuum plasma electron sources
Summary form only given. This paper presents a review of recent development of physical and performances of co called “fore-vacuum plasma electron sources” operated at pressure range 10-100 Pa. A number of unique parameters of the e-beam were obtained, such as electron dc energy (to 20 keV), dc beam current (up 0.5 A), pulsed current (up to 100A, 1 ms) and total e-beam power (up to 5 kW). For electron beam generation at these relatively high pressures, the following special features are important: high probability of electrical breakdown within the accelerating gap, a strong influence of back-streaming ions both the emission electrode and the emitting plasma, generation of secondary plasma in the beam propagation region, and intense beam-plasma interactions that lead in turn to broadening of the beam energy spectrum and beam defocusing. The descriptions of several fore-pump plasma electron sources, its performances and parameters are also presented. Main application area is electron beam treatment of non-conducting high temperature ceramics.
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