高通量电流对Au-Al多层界面反应的影响

N. Bertolino, J. Garay, Umberto Anselmi-Tamburini, Z. Munir
{"title":"高通量电流对Au-Al多层界面反应的影响","authors":"N. Bertolino, J. Garay, Umberto Anselmi-Tamburini, Z. Munir","doi":"10.1080/13642810208218356","DOIUrl":null,"url":null,"abstract":"Abstract The influence of high dc currents (up to 1019 A cm−2) on the interaction between thin Au-Al layers was investigated over the temperature range 400-500°C. In contrast with earlier diffusion couple results, only four of the five intermetalllic compounds in this system were observed, in both the absence and the presence of a current at all levels. The intermetallics Au5 Al2 and Au2 Al were the dominant products while AuAl and AuAl2 were relatively insignificant. The latter showed little change, growing only to a total thickness of a few micrometres, regardless of the magnitude of the current density and time of annealing. While the sequence of formation of the different intermetallics was not affected by the current, the incubation time and rate of growth of the layers were strongly influenced. The incubation time for the appearance of a measurable product layer was markedly reduced by the current, by nearly two orders of magnitude in some cases. The effect of the current on the nucleation of the product phases was investigated through the use of ‘pre-nucleated’ samples. The results are discussed in light of the effect of the current on atomic flux (electromigration) and on the formation of defects and compared with recent observations on field effects in multilayer systems.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"31","resultStr":"{\"title\":\"High-flux current effects in interfacial reactions in Au–Al multilayers\",\"authors\":\"N. Bertolino, J. Garay, Umberto Anselmi-Tamburini, Z. Munir\",\"doi\":\"10.1080/13642810208218356\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract The influence of high dc currents (up to 1019 A cm−2) on the interaction between thin Au-Al layers was investigated over the temperature range 400-500°C. In contrast with earlier diffusion couple results, only four of the five intermetalllic compounds in this system were observed, in both the absence and the presence of a current at all levels. The intermetallics Au5 Al2 and Au2 Al were the dominant products while AuAl and AuAl2 were relatively insignificant. The latter showed little change, growing only to a total thickness of a few micrometres, regardless of the magnitude of the current density and time of annealing. While the sequence of formation of the different intermetallics was not affected by the current, the incubation time and rate of growth of the layers were strongly influenced. The incubation time for the appearance of a measurable product layer was markedly reduced by the current, by nearly two orders of magnitude in some cases. The effect of the current on the nucleation of the product phases was investigated through the use of ‘pre-nucleated’ samples. The results are discussed in light of the effect of the current on atomic flux (electromigration) and on the formation of defects and compared with recent observations on field effects in multilayer systems.\",\"PeriodicalId\":20016,\"journal\":{\"name\":\"Philosophical Magazine Part B\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"31\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Philosophical Magazine Part B\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1080/13642810208218356\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Philosophical Magazine Part B","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1080/13642810208218356","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 31

摘要

在400-500°C的温度范围内,研究了高直流电流(高达1019 A cm−2)对薄Au-Al层相互作用的影响。与早期的扩散偶的结果相比,在没有电流和在所有水平上存在电流的情况下,该系统中只有四种金属间化合物被观察到。金属间化合物Au5 Al2和Au2 Al是主要产物,而AuAl和AuAl2相对不显著。后者的变化不大,仅增长到几微米的总厚度,无论电流密度的大小和退火时间。虽然不同金属间化合物的形成顺序不受电流的影响,但层的孵育时间和生长速度受到强烈影响。出现可测量产品层的孵化时间因电流而显著减少,在某些情况下减少了近两个数量级。通过使用“预成核”样品,研究了电流对产物相成核的影响。讨论了电流对原子通量(电迁移)和缺陷形成的影响,并与最近在多层体系中观察到的场效应进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
High-flux current effects in interfacial reactions in Au–Al multilayers
Abstract The influence of high dc currents (up to 1019 A cm−2) on the interaction between thin Au-Al layers was investigated over the temperature range 400-500°C. In contrast with earlier diffusion couple results, only four of the five intermetalllic compounds in this system were observed, in both the absence and the presence of a current at all levels. The intermetallics Au5 Al2 and Au2 Al were the dominant products while AuAl and AuAl2 were relatively insignificant. The latter showed little change, growing only to a total thickness of a few micrometres, regardless of the magnitude of the current density and time of annealing. While the sequence of formation of the different intermetallics was not affected by the current, the incubation time and rate of growth of the layers were strongly influenced. The incubation time for the appearance of a measurable product layer was markedly reduced by the current, by nearly two orders of magnitude in some cases. The effect of the current on the nucleation of the product phases was investigated through the use of ‘pre-nucleated’ samples. The results are discussed in light of the effect of the current on atomic flux (electromigration) and on the formation of defects and compared with recent observations on field effects in multilayer systems.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
The magnetic properties of the Sherrington-Kirkpatrick model for spin glasses 3d transition metal intercalates of the niobium and trantalum dichalcogenides Invar effect in Pu-Ga alloys The origin of radiation instability in yttrium-ion-doped lead tungstate crystals An unusual hollow cylindrical Fermi surface of a quasi-two-dimensional compound CeAgSb2
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1