{"title":"菲涅耳透镜的设计与制造","authors":"M. Kusko, A. Avram, D. Apostol","doi":"10.1109/SMICND.2008.4703451","DOIUrl":null,"url":null,"abstract":"In this paper are presented the results on design, simulation and fabrication of Fresnel lenses. In the theoretical section the design concepts and BPM simulations results are presented, and in the experimental section details about controlled RIE etching process of various materials are provided. Much attention is dedicated to find the etching rate corresponding to etching process parameters and substrate type.","PeriodicalId":6406,"journal":{"name":"2008 IEEE International Conference on Semiconductor Electronics","volume":"67 1","pages":"445-448"},"PeriodicalIF":0.0000,"publicationDate":"2008-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Design and fabrication of Fresnel lenses\",\"authors\":\"M. Kusko, A. Avram, D. Apostol\",\"doi\":\"10.1109/SMICND.2008.4703451\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper are presented the results on design, simulation and fabrication of Fresnel lenses. In the theoretical section the design concepts and BPM simulations results are presented, and in the experimental section details about controlled RIE etching process of various materials are provided. Much attention is dedicated to find the etching rate corresponding to etching process parameters and substrate type.\",\"PeriodicalId\":6406,\"journal\":{\"name\":\"2008 IEEE International Conference on Semiconductor Electronics\",\"volume\":\"67 1\",\"pages\":\"445-448\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-12-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 IEEE International Conference on Semiconductor Electronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.2008.4703451\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Conference on Semiconductor Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2008.4703451","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
In this paper are presented the results on design, simulation and fabrication of Fresnel lenses. In the theoretical section the design concepts and BPM simulations results are presented, and in the experimental section details about controlled RIE etching process of various materials are provided. Much attention is dedicated to find the etching rate corresponding to etching process parameters and substrate type.
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